pmos工艺仿真.doc

go athenaline x loc=-10 spac=0.5line x loc=0 spac=0.5line x loc=10 spac=0.5line y loc=0 spac=0.5line y loc=10 spac=0.5init silicon orientation=100 two.ddiffuse temp=1100 time=30 weto2extract name=Tox thickness oxide mat.occno=1 x.val=0set lay_left=2set lay_right=7illumination g.lineillum.filter clear.fil circle sigma=0.38projection na=.54pupil.filter clear.fil circlelayout lay.clear x.lo=0 z.lo=-3 x.hi=$lay_left z.hi=3layout x.lo=$lay_right z.lo=-3 x.hi=9 z.hi=3image clear win.x.lo=0 win.z.lo=-0.5 win.x.hi=9 win.z.hi=0.5 dx=0.05one.dstructure outfile=mask.str intensity maskTonyplot mask.strdeposit name.resist=AZ1350J thick=.8 division=30rate.dev name.resist=AZ1350J i.line c.dill=0.018structure outfile=preoptolish.strTonyplot preoptolith.strexpose dose=240.0 num.refl=10bake time=30 temp=100develop kim time=60 steps=6 substeps=24structure outfilr=optolith.strrate.etch machine=wet oxide wet.etch isotropic=0.5 u.metch machine=wet time=2 minutesimplant phosphor dose=1e13 energy=150diffuse time=35 temp=1000extract name=xj xj material=Silicon mat.occno=1 x.val=0 junc.occno=1etch oxide alldiffuse temp=950 time=30 dryo2extract name=Tox thickness oxide mat.occno=1 x.val=0tonyplotset lay_left=-6set lay_right=-1illumination g.lineillum.filter clear.fil circle sigma=0.38projection na=.54pupil.filter clear.fil circlelayout lay.clear x.lo=-8 z.lo=-3 x.hi=$lay_left z.hi=3layout x.lo=$lay_right z.lo=-3 x.hi=1 z.hi=3image clear win.x.lo=-8 win.z.lo=-0.5 win.x.hi=1 win.z.hi=0.5 dx=0.05one.dstructure outfile=mask.str intensity maskTonyplot mask.strdeposit name.resist=AZ1350J thick=.8 division=30rate.dev name.resist=AZ1350J i.line c.dill=0.018structure outfile=preoptolish.strTonyplot preoptolith.strexpose dose=240.0 num.refl=10bake time=30 temp=100develop kim time=60 steps=6 substeps=24structure outfilr=optolith.strimplant boron dose=1e13 energy=100 tilt=7diffuse time=35 temp=1200etch oxide alldiffuse temp=950 time=60 dryo2extract name=Tox thickness oxide mat.occno=1 x.val=0deposit nitride thick=0.12 div=5set lay_left=-0.5set lay_right=1.5illumination g.lineillum.filter clear.fil circle sigma=0.38projection na=.54pupil.filter clear.fil circlelayout lay.clear x.lo=-2 z.lo=-3 x.hi=$lay_left z.hi=3layout x.lo=$lay_right z.lo=-2 x.hi=1 z.hi=3image clear win.x.lo=-2 win.z.lo=-0.5 win.x.hi=3 win.z.hi=0.5 dx=0.05one.dstructure outfile=mask.str intensity maskTonyplot mask.strdeposit name.resist=AZ1350J thick=.8 division=30rate.dev name.resist=AZ1350J i.line c.dill=0.018structure outfile=preoptolish.strTonyplot preoptolith.strexpose dose=240.0 num.refl=10bake time=30 temp=100develop kim time=60 steps=6 substeps=24structure outfilr=optolith.strset lay_left=-8.5set lay_right=-6.5illumination g.lineillum.filter clear.fil circle sigma=0.38projection na=.54pupil.filter clear.fil circlelayout lay.clear x.lo=-10 z.lo=-3 x.hi=$lay_left z.hi=3layout x.lo=$lay_right z.lo=-10 x.hi=1 z.hi=3image clear win.x.lo=-10 win.z.lo=-5 win.x.hi=3 win.z.hi=0.5 dx=0.05one.dstructure outfile=mask.str intensity maskTonyplot mask.strdeposit name.resist=AZ1350J thick=.8 division=30rate.dev name.re