史上经典的CMOS工艺流程,入门必备

1、www2.austin.cc.tx.us/HongXiao/Book.htm1Hong Xiao, Ph. D.Author of Introduction of Semiconductor Manufacturing Technologyhttp:/www2.austin.cc.tx.us/HongXiao/Bwww2.austin.cc.tx.us/HongXiao/Book.htm2P-WaferCMOS PROCESS FLOWwww2.austin.cc.tx.us/HongXiao/Book.htm3P-EpiP-WaferDeposit p-type epitaxial sili

2、conCMOS PROCESS FLOWwww2.austin.cc.tx.us/HongXiao/Book.htm4P-EpiP-WaferDeposit p-type epitaxial siliconCMOS PROCESS FLOWwww2.austin.cc.tx.us/HongXiao/Book.htm5P-EpiP-WaferDeposit p-type epitaxial siliconCMOS PROCESS FLOWwww2.austin.cc.tx.us/HongXiao/Book.htm6P-EpiP-WaferDeposit p-type epitaxial sili

3、conCMOS PROCESS FLOWwww2.austin.cc.tx.us/HongXiao/Book.htm7P-EpiP-WaferDeposit p-type epitaxial siliconCMOS PROCESS FLOWwww2.austin.cc.tx.us/HongXiao/Book.htm8P-EpiP-WaferDeposit p-type epitaxial siliconCMOS PROCESS FLOWwww2.austin.cc.tx.us/HongXiao/Book.htm9P-EpiP-WaferDeposit p-type epitaxial sili

4、conCMOS PROCESS FLOWwww2.austin.cc.tx.us/HongXiao/Book.htm10P-EpiP-WaferCMOS Process Flow: Well FormationWafer www2.austin.cc.tx.us/HongXiao/Book.htm11P-EpiP-WaferCMOS Process Flow: Well FormationGrow screen www2.austin.cc.tx.us/HongXiao/Book.htm12P-EpiP-WaferCMOS Process Flow: Well FormationGrow sc

5、reen www2.austin.cc.tx.us/HongXiao/Book.htm13P-EpiP-WaferWafer cleanCMOS Process Flow: Well Fwww2.austin.cc.tx.us/HongXiao/Book.htm14P-EpiP-WaferPre-bake, apply primerCMOS Process Flow: Well Fwww2.austin.cc.tx.us/HongXiao/Book.htm15P-EpiP-WaferSpin-on photoresistCMOS Process Flow: Well FormationPwww

6、2.austin.cc.tx.us/HongXiao/Book.htm16P-EpiP-WaferCMOS Process Flow: Well FormationPhotoresistSpin-on www2.austin.cc.tx.us/HongXiao/Book.htm17P-EpiP-WaferCMOS Process Flow: Well FormationPhotoresistSpin-on www2.austin.cc.tx.us/HongXiao/Book.htm18P-EpiP-WaferCMOS Process Flow: Well FormationPhotoresis

7、tSpin-on www2.austin.cc.tx.us/HongXiao/Book.htm19P-EpiP-WaferCMOS Process Flow: Well FormationPhotoresistSpin-on www2.austin.cc.tx.us/HongXiao/Book.htm20P-EpiP-WaferCMOS Process Flow: Well FormationPhotoresistSpin-on www2.austin.cc.tx.us/HongXiao/Book.htm21P-EpiP-WaferCMOS Process Flow: Well Formati

8、onPhotoresistSpin-on www2.austin.cc.tx.us/HongXiao/Book.htm22P-EpiP-WaferSoft bakeCMOS Process Flow: Well FormationPwww2.austin.cc.tx.us/HongXiao/Book.htm23P-EpiP-WaferSoft bakeCMOS Process Flow: Well FormationPwww2.austin.cc.tx.us/HongXiao/Book.htm24P-EpiP-WaferSoft bakeCMOS Process Flow: Well Form

9、ationPwww2.austin.cc.tx.us/HongXiao/Book.htm25Mask 1: N-well www2.austin.cc.tx.us/HongXiao/Book.htm26Mask 1: N-well www2.austin.cc.tx.us/HongXiao/Book.htm27Mask 1: N-well www2.austin.cc.tx.us/HongXiao/Book.htm28Mask 1: N-well www2.austin.cc.tx.us/HongXiao/Book.htm29Mask 1: N-well www2.austin.cc.tx.u

10、s/HongXiao/Book.htm30Mask 1: N-well www2.austin.cc.tx.us/HongXiao/Book.htm31Mask 1: N-well www2.austin.cc.tx.us/HongXiao/Book.htm32Mask 1: N-well www2.austin.cc.tx.us/HongXiao/Book.htm33Mask 1: N-well www2.austin.cc.tx.us/HongXiao/Book.htm34Mask 1: N-well www2.austin.cc.tx.us/HongXiao/Book.htm35P-Ep

11、iP-WaferN-well mask exposeCMOS Process Flow: Well FormationPhotoresistUV or DUV www2.austin.cc.tx.us/HongXiao/Book.htm36P-EpiP-WaferN-well mask exposeCMOS Process Flow: Well FormationUV or DUV lightPwww2.austin.cc.tx.us/HongXiao/Book.htm37P-EpiP-WaferN-well mask exposeCMOS Process Flow: Well Formati

12、onPhotoresistUV or DUV www2.austin.cc.tx.us/HongXiao/Book.htm38P-EpiP-WaferN-well mask exposeCMOS Process Flow: Well FormationPhotoresistUV or DUV www2.austin.cc.tx.us/HongXiao/Book.htm39P-EpiP-WaferN-well mask exposeCMOS Process Flow: Well FormationPhotoresistUV or DUV www2.austin.cc.tx.us/HongXiao

13、/Book.htm40P-EpiP-WaferN-well mask exposeCMOS Process Flow: Well FormationPhotoresistUV or DUV www2.austin.cc.tx.us/HongXiao/Book.htm41P-EpiP-WaferN-well mask exposeCMOS Process Flow: Well FormationPhotoresistUV or DUV www2.austin.cc.tx.us/HongXiao/Book.htm42P-EpiP-WaferN-well mask exposePost exposu

14、re bakeCMOS Process Flow: Well FormationPwww2.austin.cc.tx.us/HongXiao/Book.htm43P-EpiP-WaferCMOS Process Flow: Well FormationP-EpiP-WaferCMOS Process Flow: Well FormationDevelopPwww2.austin.cc.tx.us/HongXiao/Book.htm44P-EpiP-WaferDevelopCMOS Process Flow: Well FormationPwww2.austin.cc.tx.us/HongXia

15、o/Book.htm45P-EpiP-WaferDevelopCMOS Process Flow: Well FormationPwww2.austin.cc.tx.us/HongXiao/Book.htm46P-EpiP-WaferDevelopCMOS Process Flow: Well FormationPwww2.austin.cc.tx.us/HongXiao/Book.htm47P-EpiP-WaferDevelopCMOS Process Flow: Well FormationPwww2.austin.cc.tx.us/HongXiao/Book.htm48P-EpiP-Wa

16、ferDevelopCMOS Process Flow: Well FormationPwww2.austin.cc.tx.us/HongXiao/Book.htm49P-EpiP-WaferHard bakePattern checkCMOS Process Flow: Well FormationPwww2.austin.cc.tx.us/HongXiao/Book.htm50P-EpiP-WaferCMOS Process Flow: Well FormationN-well ion implantation, phosphorusPhotoresistN-WellP+P+www2.au

17、stin.cc.tx.us/HongXiao/Book.htm51P-EpiP-WaferCMOS Process Flow: Well FormationN-well ion implantation, phosphorusPhotoresistN-WellP+P+www2.austin.cc.tx.us/HongXiao/Book.htm52P-EpiP-WaferCMOS Process Flow: Well FormationN-well ion implantation, phosphorusPhotoresistN-WellP+P+www2.austin.cc.tx.us/Hong

18、Xiao/Book.htm53P-EpiP-WaferCMOS Process Flow: Well FormationN-well ion implantation, phosphorusPhotoresistN-WellP+P+www2.austin.cc.tx.us/HongXiao/Book.htm54P-EpiP-WaferCMOS Process Flow: Well FormationN-well ion implantation, phosphorusPhotoresistN-WellP+P+www2.austin.cc.tx.us/HongXiao/Book.htm55P-E

19、piP-WaferCMOS Process Flow: Well FormationN-well ion implantation, phosphorusPhotoresistN-WellP+P+www2.austin.cc.tx.us/HongXiao/Book.htm56P-EpiP-WaferCMOS Process Flow: Well FormationN-well ion implantation, phosphorusPhotoresistN-WellP+P+www2.austin.cc.tx.us/HongXiao/Book.htm57P-EpiP-WaferCMOS Proc

20、ess Flow: Well FormationN-well ion implantation, phosphorusPhotoresistN-WellP+P+www2.austin.cc.tx.us/HongXiao/Book.htm58P-EpiP-WaferCMOS Process Flow: Well FormationN-well ion implantation, phosphorusPhotoresistN-WellP+P+www2.austin.cc.tx.us/HongXiao/Book.htm59P-EpiP-WaferCMOS Process Flow: Well For

21、mationN-well ion implantation, phosphorusPhotoresistN-WellP+P+www2.austin.cc.tx.us/HongXiao/Book.htm60P-EpiP-WaferCMOS Process Flow: Well FormationN-well ion implantation, phosphorusPhotoresistN-WellP+P+www2.austin.cc.tx.us/HongXiao/Book.htm61P-EpiP-WaferCMOS Process Flow: Well FormationN-well ion i

22、mplantation, phosphorusPhotoresistN-WellP+P+www2.austin.cc.tx.us/HongXiao/Book.htm62P-EpiP-WaferCMOS Process Flow: Well FormationN-well ion implantation, phosphorusPhotoresistN-WellP+P+www2.austin.cc.tx.us/HongXiao/Book.htm63P-EpiP-WaferCMOS Process Flow: Well FormationN-well ion implantation, phosp

23、horusPhotoresistN-WellP+P+www2.austin.cc.tx.us/HongXiao/Book.htm64P-EpiP-WaferCMOS Process Flow: Well FormationN-well ion implantation, phosphorusPhotoresistN-Well P+P+www2.austin.cc.tx.us/HongXiao/Book.htm65P-EpiP-WaferCMOS Process Flow: Well FormationN-well ion implantation, phosphorusPhotoresistN

24、-Well P+P+www2.austin.cc.tx.us/HongXiao/Book.htm66P-EpiP-WaferCMOS Process Flow: Well FormationStrip photoresistPhotoresistN-Wwww2.austin.cc.tx.us/HongXiao/Book.htm67P-EpiP-WaferCMOS Process Flow: Well FormationStrip photoresistPhotoresistN-Wwww2.austin.cc.tx.us/HongXiao/Book.htm68P-EpiP-WaferCMOS P

25、rocess Flow: Well FormationStrip photoresistPhotoresistN-Wwww2.austin.cc.tx.us/HongXiao/Book.htm69P-EpiP-WaferCMOS Process Flow: Well FormationStrip photoresistPhotoresistN-Wwww2.austin.cc.tx.us/HongXiao/Book.htm70P-EpiP-WaferCMOS Process Flow: Well FormationStrip photoresistPhotoresistN-Wwww2.austi

26、n.cc.tx.us/HongXiao/Book.htm71P-EpiP-WaferCMOS Process Flow: Well FormationStrip photoresistPhotoresistN-Wwww2.austin.cc.tx.us/HongXiao/Book.htm72P-EpiP-WaferCMOS Process Flow: Well FormationStrip photoresistWafer cleanN-Wwww2.austin.cc.tx.us/HongXiao/Book.htm73P-EpiP-WaferCMOS Process Flow: Well Fo

27、rmationN-WellAnneal and drive-www2.austin.cc.tx.us/HongXiao/Book.htm74P-EpiP-WaferCMOS Process Flow: Well FormationN-WellAnneal and drive-www2.austin.cc.tx.us/HongXiao/Book.htm75P-EpiP-WaferCMOS Process Flow: Well FormationN-WellAnneal and drive-www2.austin.cc.tx.us/HongXiao/Book.htm76P-EpiP-WaferCM

28、OS Process Flow: Well FormationN-WellAnneal and drive-www2.austin.cc.tx.us/HongXiao/Book.htm77CMOS Process Flow: Well FormationP-EpiP-WaferN-WellAnneal and drive-www2.austin.cc.tx.us/HongXiao/Book.htm78CMOS Process Flow: Well FormationP-EpiP-WaferN-WellCwww2.austin.cc.tx.us/HongXiao/Book.htm79CMOS P

29、rocess Flow: Well FormationP-EpiP-WaferN-WellPre-bake, apply www2.austin.cc.tx.us/HongXiao/Book.htm80CMOS Process Flow: Well FormationP-EpiP-WaferN-WellSpin-on www2.austin.cc.tx.us/HongXiao/Book.htm81CMOS Process Flow: Well FormationP-EpiP-WaferN-WellSoft www2.austin.cc.tx.us/HongXiao/Book.htm82Mask

30、 2: P-well www2.austin.cc.tx.us/HongXiao/Book.htm83Mask 2: P-well www2.austin.cc.tx.us/HongXiao/Book.htm84Mask 2: P-well www2.austin.cc.tx.us/HongXiao/Book.htm85Mask 2: P-well www2.austin.cc.tx.us/HongXiao/Book.htm86Mask 2: P-well www2.austin.cc.tx.us/HongXiao/Book.htm87Mask 2: P-well www2.austin.cc

31、.tx.us/HongXiao/Book.htm88Mask 2: P-well www2.austin.cc.tx.us/HongXiao/Book.htm89Mask 2: P-well www2.austin.cc.tx.us/HongXiao/Book.htm90Mask 2: P-well www2.austin.cc.tx.us/HongXiao/Book.htm91Mask 2: P-well www2.austin.cc.tx.us/HongXiao/Book.htm92Mask 2: P-well www2.austin.cc.tx.us/HongXiao/Book.htm9

32、3CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistP-well mask exposeUV www2.austin.cc.tx.us/HongXiao/Book.htm94CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistP-well mask exposeUV www2.austin.cc.tx.us/HongXiao/Book.htm95CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPh

33、otoresistP-well mask exposeUV www2.austin.cc.tx.us/HongXiao/Book.htm96CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistP-well mask exposeUV www2.austin.cc.tx.us/HongXiao/Book.htm97CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistP-well mask exposeUV www2.austin.cc.tx.us/Hon

34、gXiao/Book.htm98CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistP-well mask exposeUV www2.austin.cc.tx.us/HongXiao/Book.htm99CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistPost exposure www2.austin.cc.tx.us/HongXiao/Book.htm100CMOS Process Flow: Well FormationP-EpiP-Wafe

35、rN-WellPhotoresistDwww2.austin.cc.tx.us/HongXiao/Book.htm101CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistDwww2.austin.cc.tx.us/HongXiao/Book.htm102CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistDwww2.austin.cc.tx.us/HongXiao/Book.htm103CMOS Process Flow: Well Formatio

36、nP-EpiP-WaferN-WellPhotoresistDwww2.austin.cc.tx.us/HongXiao/Book.htm104CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistDwww2.austin.cc.tx.us/HongXiao/Book.htm105CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistHard www2.austin.cc.tx.us/HongXiao/Book.htm106CMOS Process Flo

37、w: Well FormationP-EpiP-WaferN-WellPhotoresistPattern www2.austin.cc.tx.us/HongXiao/Book.htm107CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistP-well ion implantation, BoronP-WellB+www2.austin.cc.tx.us/HongXiao/Book.htm108CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistP-

38、well ion implantation, BoronP-WellB+www2.austin.cc.tx.us/HongXiao/Book.htm109CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistP-well ion implantation, BoronP-WellB+www2.austin.cc.tx.us/HongXiao/Book.htm110CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistP-well ion implantat

39、ion, BoronP-WellB+www2.austin.cc.tx.us/HongXiao/Book.htm111CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistP-well ion implantation, BoronP-WellB+www2.austin.cc.tx.us/HongXiao/Book.htm112CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistP-well ion implantation, BoronP-WellB+

40、www2.austin.cc.tx.us/HongXiao/Book.htm113CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistP-well ion implantation, BoronP-WellB+www2.austin.cc.tx.us/HongXiao/Book.htm114CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistP-well ion implantation, BoronP-WellB+www2.austin.cc.tx.

41、us/HongXiao/Book.htm115CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistP-well ion implantation, BoronP-WellB+www2.austin.cc.tx.us/HongXiao/Book.htm116CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistP-well ion implantation, BoronP-WellB+www2.austin.cc.tx.us/HongXiao/Book.h

42、tm117CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistP-well ion implantation, BoronP-WellB+www2.austin.cc.tx.us/HongXiao/Book.htm118CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistStrip photoresistP-WellB+www2.austin.cc.tx.us/HongXiao/Book.htm119CMOS Process Flow: Well Fo

43、rmationP-EpiP-WaferN-WellPhotoresistStrip photoresistP-WellB+www2.austin.cc.tx.us/HongXiao/Book.htm120CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistStrip photoresistP-WellB+www2.austin.cc.tx.us/HongXiao/Book.htm121CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistStrip ph

44、otoresistP-WellB+www2.austin.cc.tx.us/HongXiao/Book.htm122CMOS Process Flow: Well FormationP-EpiP-WaferN-WellPhotoresistStrip photoresistP-WellB+www2.austin.cc.tx.us/HongXiao/Book.htm123CMOS Process Flow: Well FormationP-EpiP-WaferN-WellStrip photoresistP-WellB+www2.austin.cc.tx.us/HongXiao/Book.htm

45、124CMOS Process Flow: Well FormationP-EpiP-WaferN-WellP-WellStrip www2.austin.cc.tx.us/HongXiao/Book.htm125CMOS Process Flow: Well FormationP-EpiP-WaferN-WellAnneal and drive-inP-Wwww2.austin.cc.tx.us/HongXiao/Book.htm126CMOS Process Flow: Well FormationP-EpiP-WaferN-WellAnneal and drive-inP-Wwww2.a

46、ustin.cc.tx.us/HongXiao/Book.htm127CMOS Process Flow: Well FormationP-EpiP-WaferN-WellAnneal and drive-inP-Wwww2.austin.cc.tx.us/HongXiao/Book.htm128CMOS Process Flow: Well FormationP-EpiP-WaferN-WellAnneal and drive-inP-Wwww2.austin.cc.tx.us/HongXiao/Book.htm129CMOS Process Flow: Well FormationP-Ep

47、iP-WaferN-WellAnneal and drive-inP-Wwww2.austin.cc.tx.us/HongXiao/Book.htm130CMOS Process Flow: Well FormationP-EpiP-WaferN-WellAnneal and drive-inP-Wwww2.austin.cc.tx.us/HongXiao/Book.htm131CMOS Process Flow: Well FormationP-EpiP-WaferN-WellAnneal and drive-inP-Wwww2.austin.cc.tx.us/HongXiao/Book.h

48、tm132CMOS Process Flow: Well FormationP-EpiP-WaferN-WellAnneal and drive-inP-Wwww2.austin.cc.tx.us/HongXiao/Book.htm133P-EpiP-WaferN-WellCMOS Process Flow: Well FormationAnneal and drive-inP-Wwww2.austin.cc.tx.us/HongXiao/Book.htm134P-EpiP-WaferN-WellCMOS Process Flow: Well FormationStrip screen oxi

49、deP-Wwww2.austin.cc.tx.us/HongXiao/Book.htm135P-EpiP-WaferN-WellCMOS Process Flow: STI FormationWafer cleanGrow pad oxideP-Wwww2.austin.cc.tx.us/HongXiao/Book.htm136P-EpiP-WaferN-WellCMOS Process Flow: STI FormationDeposit silicon nitrideP-WellNwww2.austin.cc.tx.us/HongXiao/Book.htm137P-EpiP-WaferN-

50、WellCMOS Process Flow: STI FormationDeposit silicon nitrideP-WellNwww2.austin.cc.tx.us/HongXiao/Book.htm138P-EpiP-WaferN-WellCMOS Process Flow: STI FormationDeposit silicon nitrideP-WellNwww2.austin.cc.tx.us/HongXiao/Book.htm139P-EpiP-WaferN-WellCMOS Process Flow: STI FormationDeposit silicon nitrid

51、eP-WellNwww2.austin.cc.tx.us/HongXiao/Book.htm140P-EpiP-WaferN-WellCMOS Process Flow: STI FormationDeposit silicon nitrideP-WellNwww2.austin.cc.tx.us/HongXiao/Book.htm141P-EpiP-WaferN-WellCMOS Process Flow: STI FormationDeposit silicon nitrideP-WellNwww2.austin.cc.tx.us/HongXiao/Book.htm142P-EpiP-Wa

52、ferN-WellCMOS Process Flow: STI FormationCleanP-WellNwww2.austin.cc.tx.us/HongXiao/Book.htm143P-EpiP-WaferN-WellCMOS Process Flow: STI FormationPre-bake, apply primerP-WellNwww2.austin.cc.tx.us/HongXiao/Book.htm144P-EpiP-WaferN-WellCMOS Process Flow: STI FormationSpin-on photoresistP-WellNitridePwww

53、2.austin.cc.tx.us/HongXiao/Book.htm145P-EpiP-WaferN-WellCMOS Process Flow: STI FormationSoft bakeP-WellPhotoresistNwww2.austin.cc.tx.us/HongXiao/Book.htm146P-EpiP-WaferN-WellCMOS Process Flow: STI FormationSoft bakeP-WellPhotoresistNwww2.austin.cc.tx.us/HongXiao/Book.htm147P-EpiP-WaferN-WellCMOS Pro

54、cess Flow: STI FormationSoft bakeP-WellPhotoresistNwww2.austin.cc.tx.us/HongXiao/Book.htm148P-EpiP-WaferN-WellCMOS Process Flow: STI FormationSoft bakeP-WellPhotoresistNwww2.austin.cc.tx.us/HongXiao/Book.htm149P-EpiP-WaferN-WellCMOS Process Flow: STI FormationSoft bakeP-WellPhotoresistNwww2.austin.c

55、c.tx.us/HongXiao/Book.htm150P-EpiP-WaferN-WellCMOS Process Flow: STI FormationSoft bakeP-WellPhotoresistNwww2.austin.cc.tx.us/HongXiao/Book.htm151P-EpiP-WaferN-WellCMOS Process Flow: STI FormationSoft bakeP-WellPhotoresistNwww2.austin.cc.tx.us/HongXiao/Book.htm152P-EpiP-WaferN-WellCMOS Process Flow:

56、 STI FormationSoft bakeP-WellPhotoresistNwww2.austin.cc.tx.us/HongXiao/Book.htm153Mask 3: Shallow Trench Isolation www2.austin.cc.tx.us/HongXiao/Book.htm154Mask 3: Shallow Trench Isolation www2.austin.cc.tx.us/HongXiao/Book.htm155Mask 3: Shallow Trench Isolation www2.austin.cc.tx.us/HongXiao/Book.ht

57、m156Mask 3: Shallow Trench Isolation www2.austin.cc.tx.us/HongXiao/Book.htm157Mask 3: Shallow Trench Isolation www2.austin.cc.tx.us/HongXiao/Book.htm158Mask 3: Shallow Trench Isolation www2.austin.cc.tx.us/HongXiao/Book.htm159Mask 3: Shallow Trench Isolation www2.austin.cc.tx.us/HongXiao/Book.htm160

58、Mask 3: Shallow Trench Isolation www2.austin.cc.tx.us/HongXiao/Book.htm161Mask 3: Shallow Trench Isolation www2.austin.cc.tx.us/HongXiao/Book.htm162Mask 3: Shallow Trench Isolation www2.austin.cc.tx.us/HongXiao/Book.htm163Mask 3: Shallow Trench Isolation www2.austin.cc.tx.us/HongXiao/Book.htm164P-Ep

59、iP-WaferN-WellCMOS Process Flow: STI FormationP-WellPhotoresistShallow trench isolation mask exposeNitrideUV www2.austin.cc.tx.us/HongXiao/Book.htm165P-EpiP-WaferN-WellCMOS Process Flow: STI FormationP-WellPhotoresistShallow trench isolation mask exposeNitrideUV www2.austin.cc.tx.us/HongXiao/Book.ht

60、m166P-EpiP-WaferN-WellCMOS Process Flow: STI FormationP-WellPhotoresistShallow trench isolation mask exposeNitrideUV www2.austin.cc.tx.us/HongXiao/Book.htm167P-EpiP-WaferN-WellCMOS Process Flow: STI FormationP-WellPhotoresistShallow trench isolation mask exposeNitrideUV www2.austin.cc.tx.us/HongXiao