蓝宝石PSS工艺流程.ppt

,1. company overview,aug 2007,hq : 526 chobu-ri, mohyun-myeon, yong-in, korea factory : ( ),address,semiconductor technology development, and services,lim, heechoul,hq tel: +82 31 339 2970; fax: +82 31 339 2972 factory tel : +82 62 605 9566,pss and led production equipment,,type of business,establishment,ceo,major products,contact,e-mail,firstar photon co., ltd,company name,1,,homepage,: mocvd(2”x 6ea),2. factory ,2,3. products pss,3,typical size : 2”, 3”, 4”,pss(patterned sapphire substrate) for epi growth,430m 900m,available wafer thick,within : 2%, w to w : 3%,uniformity,china, japan, usa,current sales,4. pss production overview,4,5. process of pss production,5,etching,develop,photo,exposure,1. photo-resist coating,2. stepping & exposure,3. developing exposed patterns,4. dry etching by icp-rie,6. pss equipments,6,stepper system,track system,icp-rie,wet bath,measurement,7. pss pattern list,7,7,8. pss pattern image product d0b (4x1 pattern),8,8. pss pattern image product b5c (2.5 x 1.5 pattern),9,8. pss pattern image product b8b (2.8 x 1.2 pattern),10,8. pss pattern image product b0a (2 x 1 pattern),11,8. pss pattern image product a5a (1.5 x 1 pattern),12,9. inspection standard a, b, c grade,13,10. process of pss production d1.90,14,10. pss shape & led chip characteristic d1.84,15,10. pss shape and led chip characteristics d1.78,16,10. pss shape & led chip characteristic d1.78,17,10. pss shape & led chip characteristic d1.56,18,10. pss shape & led chip characteristic d1.56,19,chip size: 14mil,11. pss depth vs intensity,20,normal wafer,depth=1.2 ,depth=1.7 ,depth=1.4 ,14mil,depth=1.9 ,depth=1.84 ,depth=1.78 ,depth=1.56 ,24mil,55,70,98,600(24mil) =130(14mil),650(24mil) =132(14mil),675(24mil) =134(14mil),700(24mil) =137(14mil),pss depth vs intensity,128,12. epi growth equipment(mocvd : nextpak nep2007),21,13. process sem image of epitaxial growth of gan with pss substrate,22,14. sem after epi growth with pss,23,15. view of pss state by microscope,24,growth condition : u-gan1010,n-gan1030 ,u-gan pressure250,u-gan,n-gan ga=95, sem images of gan layers on pss patten,25, effcet of enhancement output related to pss patten shape,26, effcet of enhancement output related to pss patten shape,27,effcet of enhancement output related to pss patten shape,28,