苏州某半导体企业作业指导书（经典）.doc

晶方半导体科技(苏州)有限公司China Wafer Level CSP LTD.Machine for sop文件编号DOC#:版次Rev:生效日期Effective:1 the process for switch on 1.1 the preparation：1.1.1 check all connection are ok. 确认所有的链接都是ok1.1.2 check that all protective equipment for the LLSEVO II is connected and make sure that this equipment functions correctly 确认所有的保护设备都已经连接，并且功能正常。1.1.3 check the operating media for the vacuum pumps 确认真空泵所需的气体等是正常的1.1.4 inspect the water lines for wetness(leaks) 检查水管是否漏水1.1.6 Open the drain valve first and then the supply valves.and check the water pressure to approx 4bar 先开出水阀，再开供水阀，并且检查水的压力是否是4bar，如果不是，则进行调整1.1.7 open the compressed air supply and check the static pressure at the compressed air conditioner to 6-8bar 打开压缩气体的供气阀，并确认静态压力是 6-8bar。1.1.11 open the process gas supply and check the static pressure to approx 0.5bar 打开制程用气体（Ar），并且确认其静态压力大约是0.5bar1.1.12open the vent gas supply and check the static pressure to approx.1.5 bar. 打开N2的供气阀，并且确认其静态压力大约为1.5bar1.1.13 check that all EMERGENCY-OFF buttons are released 使所有的EMO键都被开启1.2 the method for switch on （开机方法）1.2.1 Switch on the main switch at the power rack door from 0 to I 打开电控柜上的电源主开关 （如图所示） 1.2.2Switch on the UPS power 打开UPS的电源开关（如图所示） 1.2.3Switch on the PLC power, then the red light will shine 打开PLC电源，这时PC上的红灯将会闪烁。如图说示1.2.4 push down the RESET on the rack .1.2.5when the status is stabile in the PLC ,then Switch on the GUI power.1.2.6 waiting for the overview showing.1.27 click” push to enter”2.the process for switch off2.1Checking all processes are ended2.2check the cage is in the Load Chamber2.3check the door of LC is closed2.4clickMiscellaneousGUI Control clickMiscellaneousGUI Control2.5clickshut down PLC PC clickshut down PLC PC2.6clickshut down GUI PC clickshut down GUI PC2.7switch off the main power2.7.1switch off UPS2.7.2switch off the cooling water enter in2.7.3switch off the cooling water out2.7.4off the main gas valve 2.7.5push down all the EMO switch3.The process for PM1. Vent LC/MC2. Move Cage at the middle of the way3. Regen the Cyro pumps4. open MC5. remove the shutter boxes6. remove the shields inside the chamber7. remove the parts clean on the cage and clean the spring leaves8. clean the chamber by vacuum and IPA9. mount all the shields and test shutter movement by cylinder switch10. change the LC/MC sealing O-ring11. change the electrode of the targets12. change the targets strips13. test the resistance between targets and electrode(more than 700kohmes)14. clean the cathode and move back to position15. close all safety switches 16. move cage up/down to test the O-ring17. move cage to up position18. open etching box and the top plate19. remove the top plates and cage out(clean and change the shields)20. change the shields inside the LC after clean21. change the etching box and dark space wings22. change the heater hood23. mount the cage and substrate holder24. move the etching device to stand by position25. test the gap between the dark wings and substrate holder(3mm)26. mount the top plate27. pump down system28. Game Over 4.the test to the machine for quality after pm1. check the MC/LC base pressure and leak after 12 hours pump down2. test the MC plasma ignition, include all targets manually, the method as such the picture;3. test the ALs deposition rates and uniformities 4. test the etch rates and uniformities.(ignite)The method is such as : 4.1 start the cage rotation:30s/p4.2 open the gas#2_Ar.4.3 regulate the Gas#2_Ar: 12 sccm.4.4 Set the power :0.1KW4.5 Power Standby.4.6 Power on4.7 Increase the power up to 0.7KW4.8 Last for 3 minutes.4.9 Power off4.10 Close the gas#2_Ar4.11 Stop the cage rotation.5. test the MC sputtering:5.1 transport the cage from LC to MC5.2 start the cage rotation；30s/p5.3 open the gas #1_Ar5.4 regulate the gas#1_Ar:120sccm5.5 set the power:1KW5.6 power standby5.7 power on5.8 increase the power up to 12KW5.9 last for 3minutes5.10 power off5.11 close the gas#1_Ar5.12 stop the cage rotation5.13 transport the cage from MC to LCthe process for regen:purpose :In order to ensure the working quality of “ Leybold TW 1600 turbopump and messinor”When the Meissner trap works too long time ,its surface is adhered to ice too much , and effect the quality for absorbing water vapor.And the turbopump also keep in tied status , and can reduce the working quality.1. preparation before regening:1.1 ensure there is no running wafers in the chamber .1.2 authorized people to do this operation.2. the detail process for regen( rule: one time in one week)2.1 enter the mode ”service/maintenance”, and input the user name & passport The user name and passport The operating mode “service/maintenance”Click “system” Figure：1 2.2open the screen”overview” system(such as above)2.3click the “PKR”,and will show the dialog box : as follow Figure：2 2.4click”regen”,and will pop-up the following yellow dialog-box: Figure：32.5 click “start regeneration LC&MC”，then the machine will run the operation ”regen”2.6 After about 3.5 hours ,the regeneration will be finished ,and the column “pump status LC& pump status MC” will show “regen complete”2.7click the meiss. in the figure:2,then will pop-up the following dialog box: Figure:42.8 click the “ cool “ ,waiting for the operation completed.1502551.2 The notice list :1.2.1 Normally, the oil is clear and transparent. If the oil colordarkens, the oil should be changed. 1.2.2 If the viscosity at 25C reaches a value of 300 mPa x s(= 300 cP) or at 80 C a value of 10 mPa x s (= 10 cP) .the oil should be changed.2. the method to Change the oil 2.1 The type of oil : N 62 or special and alternative oils.(at present ,there is about 200ml left in our cleanroom).2.2 the changing for oil :2.2.1 First oil change after 100 operating hours.(the point is in the menue)2.2.2 Pump switched off and cold.2.2.3 Change the oil when the pump is cold in order to avoid releasing absorbed gases.2.2.4 making the screw loose ,and infuse the oil with a filter carefully.2.2.5 tight the screw. disposal for exceptional condition note: only the trained people can execute the operation for avoiding the alarm 1.the alarm when the machine is in the operating.Alarm namethe frequency for appearancethe causing reasonthe disposal methodremarkCage Rotation errorfrequentlyTurning the case by hand at full tileinitial the cageCage Drive No CommunicationfrequentlyTurning the case by hand at full tileinitial the cageend of cryopump LcSingularly Afer regen ,dont reset the time for regen lifetimeReset the lifetime in the miscelanecus Clean o-ring LC/MCOften The ability of o-ring reducingTest the leakrate and determine if Cleaning the o-ring Meissner Polycold Not ReadySingularlyThe polycold errorPush the “reset” in the polycoldThe pressure air not okSingularlyThe CDAs pressure is not in normal conditionContact the factory engineer2.the accident :2.1 forseeing that electronic will be stop, the method to disposing 2.1.1 Affirm the time that the electronic will break off, and if the running wafer is in the chamber, check the left time ,and if the recipe would complete before the power cut.If the time allows, make the recipe run out ,then switch off in the normal procedure ;If not ,stop the recipe immediately ,but not make the high vacuum vent,and switch off the machine in the normal process.2.1.2 unforseen the accident ,such as the power is cut immediately.This document is the exclusive property of China Wafer Level CSP LTD. and shall not be reproduced or copied or transformed to any o