N的电子结合能

1、N的电子结合能XPS_DatabaseN1S的电子结合能：Energy(eV)ElementChemicalbondingRef395.7N1sN-C43396N1sinthepassivefi396.1N1sN-CintheTiNcoatingsbeforeerosion43396.2N1sNbondedinAlN,Ener175cristal396.3N1sAlN225396.3N1sCr-N396.3N1sNbondedinAlN,EnergyN2+=500eV,IAD139396.4N1s225powder94396.4N1sAs-receivedAlN396.4N1sAlN/PVBb

2、inderburnoutinair94396.4N1sAlN/PVBbinderburnoutinburnoutinair94396.4N1sAlN/PPCbinderburnoutinnitrogen94194396.4N1sAlN396.5N1sNbondedinAlN,Magnetron,N2,N2+Ar139150396.6N1sCrN197口396Q6N1SQTiN396Q6N1SQCrQtrait叮aUQNaNO3Q17Q396Q6N1SQFeQtraitQQaUQNaNO3Q17Q39396.7N1sN-Ti43396.8N1sN:Ti31208396.8N1sN:Ti396.8

3、N1sNdsCrN55148W/TiN396.9N1sInterface396.9N1sDInterfaceDTiN/SiO2(=TiN)D148396.9N1sDTiN(100)usingaDphotonenergy396.9N1sDSS304DtraitoDauNaNO317396.9N1sinterfaceDW/TiNaprqsbombD(275min)DaprqsbombD(750Dmin)DTiNpur148396.9N1sDstructureDW/TiN/SiD(Wpur)Daprqsbomb(NaNO317D397N1s904LDtraitoauDNaNO3D17397N1sDA

4、L6XDtraitoauDNaNO3D17D397N1sDNadaftersputteringDtheDpassivefilm116D397N1sDCrNinDalloy33DafterDsputteringthO0.1731397.1N1sTiN0.54O0.0831397.1N1sTiN0.63397.1N1sTiN0.7531208397.1N1sTiN0,75397.1N1sN-TiintheTiNcoatingsbeforeandaftererosion43O0.4431397.2N1sTiN0.31397.2N1simplantationdeNdansSS304225397.2N1

5、sTiN0,31O0,44208口397Q2N1SQNadsosureIacierodectypeo304Qn92口397.2NIS口Nds口304Qssonitroo218口397397.3N1sTiN0.09O0.7431397.3N1sTiN10111397.3N1sWN397.4N1sNitraitoauNaNO317397.4N1sNdsCr2N55397.4N1srel150397.5N1sSi3N4397.5N1sK4Fe(CN)6111397.5N1sTiN(100)usingaphotonenergybetween440and470eV180397.5N1sNnmdeCr(f

6、aiblenrj)131397.5N1sNdsPMDA-ODAT=250Cav1,0nmdeCr(Cr-nitrid225397.6N1sCr2N397.7N1slargepicapresbombardement(5min)182192397.7N1snitride111397.8N1sNaSCN397.8N1snitride57397.9N1sC-N,pyridinicNinPVCAtreatedat573,873and1173K42397.9N1sC-N,pyridinicNinchars(1223K)149150397.9N1sBN111397.9N1sBN240397.9N1s(a,a

7、-dipyridyl)Mo(CO)4111398N1sphthalocyanine398N1sNHads76398N1sdsle304ssavecN2implante218398.1N1sGrapheneN(intotheconjug.struct.ofgraphenemlcl)71111398.1N1sKCN240398.1N1s(a,a-dipyridyl)Mo(CO)3(P(OPh)3)182pic398.3N1slarge398.3N1sauneprofondeurde0,5nm84398.3N1s-N=inacyclicstructure158240398.4N1s(a,a-dipy

8、ridyl)Mo(CO)3(P(O(n-Bu)3)398.5N1sBNa1.6evFWHM164150398.6N1sNH3398.6N1sBuNH2111111398.6N1spyridine398.6N1samineoupyridineduPolyimideKapton15111398.7N1sS2N2111398.7N1sNaN3240398.7N1s(o-phenanthroline)Mo(CO)4398.8N1sC-N-CuinCu(H2daaen)166398.8N1sauneprofondeurde0,5nm84398.8N1sfreeNininterstitialsites,E

9、nergyN2+=75eV,IAD139398.9N1sC-N,pyridinicNininitialresin149398.9N1sNdsNH2surfPET-APTES(24H)avredparLiAlH4177398.9N1splasma:NH3etN2188188398.9N1s-C=NH398.9N1sPlasma:NH3+N2/ref:284,3eVpourC1s189111399N1sPhCN399N1sAlN(NaeteremplaceparO)175399N1sNdsPMDA-ODAT=250Cav0,16nmdeCr131131399N1sCr-NO2/Ar/NH31223

10、99N1splasma:111399.1N1stetracyanoquinodimethane188399.1N1sPhNH2114C-NH-C399.1N1sR-C=NH;122O2/NH3399.1N1splasma:399.1N1sAlN(N-Obond)194111399.2N1sPhNH2111399.2N1sH2N*C6H4NO2399.2N1sNO-in316Lbeforesputteringthepassivefilm116399.2N1sNO-in316Laftersputteringthepassivefilm116399.2N1sNO-inalloy24beforespu

11、tteringthepassivefilm116399.2N1sNO-inalloy33beforesputteringthepassivefilm116240399.2N1s(N,N,N,N-tetramethylethylenediamine)Mo(CO)4111399.3N1sH2NSO2C6N4NO2114N399.3N1sAromatic399.3N1sNitrogeninanNH2state213399.4N1sC-N,pyrrolidonicNinPVPOtreatedat573K42399.4N1sC-N,pyridinicNinPVPItreatedat573,873and1

12、173K42399.4N1sNatsurfaceofSS304225399.4N1sNForN2/Ni(100)64111399.5N1sguanidineHCl104399.5N1sN-C114399.5N1sR-NH2399.5N1sNatsurface84Ar/NH3122399.5N1splasma:399.6N1sCNinH4daaen166399.6N1sN-O43399.6N1sN-C-O177114399.6N1sR-CN399.7N1sPhNHCSNHPh111399.7N1SNitraitaNH317399.7N1sSS304traitaNH317399.7N1sphi-N

13、H2114surface84399.7N1sen399.7 N1sNHamidegroup171399.8N1sConjugatedN(C=Ntype,notingraphenemolecules)71399.8N1sFetraitaNH317399.8N1sAL6X17399.8N1sNH3surlacierdetype304N92399.8N1sNH357399.8N1sO=C-NH-(C,H)114399.8 N1s-NH2(-NH)158399.81N1sC-NinKapton(TM),polyetherimidefilm205399.9N1s3aryamine(redunderX-r

14、aybeam)ininitialresin149399.9N1sPhNNPh111399.9N1sCo(NH3)8Cl3111399.9N1sMotreatedwithNH317399.9N1s317LXtreatedwithaNH317400N1sphthalocyanine111400N1sadsorptiondeN2,NH3,NH3surSS304225400N1sN2H4ads76400N1sNOxfretted(5Vfor5min)inbloodserum207400N1sNdsFe13(adsorb)218400N1sN-OintheTiNcoatingsbeforeandafte

15、rerosion43400.1N1sC-N,pyridoneinchars(1223K)149400.1N1sNa2N2O2111400.1N1sdsPE-AretPE-N(groupeorganiquenitrogene)48400.2N1sC-N,2ndaryprod.ofPVPOtreatedat573and873K42400.2N1sC-N,pyrrolicNinPVPOtreatedat1173K42400.2N1sN-HouN-O192400.3N1sC-N,pyrrolicNinPVCAtreatedat573,873and1173K42400.3N1sNOx,316Lalloy

16、fretted(30min)inbloodserum207400.3N1sPlasma:NH3+N2/rf:284,3eVpourC1s189400.4N1sC-N,pyridonicNinPVPItreatedat573,873and1173K42400.4N1sC-NduPolyimideKapton15400.4N1splasma:NH3etN2188400.4N1sgroupealiphatique188400.5N1sNOxin316Lalloydippedinbloodserum1h207400.5N1sNOxcorrosionproductsafterfrettedinblood

17、207400.7N1sC-N-HinEu(H2daaen)166400.7 N1sC-N,quaternaryNinPVPItreatedat1173K42400.7N1sNdsNH3+surfPET-APTES(24H)avredparLiAlH4177400.7N1sNForN2/Ni(100)64400.8N1sC-N-CuinCuEu(daaen)166400.8N1sNdsPMDA-ODA130400.8N1sPEapres5mindexpoauplasmanitrogene48400.9N1sNhecondensedstruct.units:chars1223K

18、149400.9 N1sH3N+CHRCOO-111400.9N1sNH4NO3111401N1sEtNH3Cl111401N1sNO(-delta)ads76401.1N1sC-N,quaternaryNinPVCAtreatedat1173K42111401.1N1sMe4NBr401.1N1sPE-NapresprotonationavecH2SO4(0,1M)48401.1N1sNH4+in316Lbeforesputteringthepassivefilm116401.1N1sNH4+in316Laftersputteringthepassivefilm116401.1N1sNH4+

19、inalloy24beforesputteringthepassivefilm116401.1N1sNH4+inalloy33beforesputteringthepassivefilm116401.2N1sNH4+inalloy24aftersputteringthepassivefilm116401.2N1sNH4+inalloy33aftersputteringthepassivefilm116401.3N1sC-N,quaternaryNinPVPOtreatedat1173K42PE-Ar-PFB48401.3N1sds401.3N1sdsPE-Ar-TFE48158401.3N1s

20、oxidizedN111401.4N1s(NH3OH)+Cl-PE-Ar-PFPH48401.4N1sds150401.5N1sNH4Cl401.5N1samino-sulfate-pyriten1-163114401.5N1sC-N+111401.6N1sp-NH3+C6H4SO3-PE-Ar48401.6N1sds401.7N1sN-methylpyridiniumininitialresin149150401.7N1sNH4NO3401.7N1sNH4+surlacierdetype304N92111401.8N1sN2H6SO4402N1sPyridine-N-oxydeinchars

21、149402N1schloranil-pyridine111402N1samino-sulfate-pyriten2-163192402N1sNH4+402.1N1sMe4NCl111inPVPItreatedat1173K42402.4N1sC-N,pyridine-N-oxyde402.7N1sN2peak,EnergyN2+=75eV,IAD139111402.8N1sMe3NO402.8N1splasma:NH3etN2188402.8N1sPlasma:NH3+N2/ref:284,3eVpourC1s189111403N1sNaN3403N1sAlN(NaeteremplaceparO,Air100C)175403N1sN2peak,EnergyN2+=1000eV,IAD139403.1N1sShake-upsatellites(pi-pi*)(entrappedNOx)149111403.