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The information contained herein is as far as we are aware true and accurate However no representations or warranties either express or implied whether of merchantable quality fitness for any particular purpose or of any other nature are hereby made in respect of the information contained in this presentation or the product or products which are the subject of it In providing this material no license or other rights whether express or implied are given with respect to any existing or pending patent patent application trademarks or other intellectual property right AZ9260 Photoresist Data Package at 12um FT 24um FT AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 2 MEMS Ink Jet FT 30 m Lift offDeep Implant Metal Etch Copper PlatingGold PlatingSolder Metal Plating FT 2 7 mFT 3 10 mFT 5 30 mFT 10 30 mFT 30 m DUV TFRH Implant FT 3 8 m AZ s Thick Film Photoresist Roadmap as of 11 2007 Materials under development AZLExp 500 AZ 12XT 20P Materials in sampling all EXP products AZ 40XT 11AZ 40XT A1 Commercialized materials AZ nLOF Series AZ MIR 900 AZ 33XT AZ N4000 AZ N6000 AZ TX 1311 VS 01HJ AZ PLP30 40 AZ 10XT AZ 5XT AZ 5nXT AZ 3nXT HR AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 3 AZ Electronic Materials Thick Photoresist Product Summary Platform DNQ Novolak CA Chemically Amplified PP Photopolymer Wavelength Red font indicates better performance Developer Compatibility Bold font indicates most compatible developer resulting in shorter develop times and lower exposure energies Thick Film Product Platform FT Range um Maximum Single coat Aspect Ratio Application Developer Compatibility P4000DNQg h2 55252 1Solder Cu Au400K TMAH 4500DNQg h2 55252 1Solder Cu Au400K TMAH 9200DNQg h i3 50253 1Solder Cu400K TMAH 10XTDNQg h i4 50253 1Solder Cu Au400K TMAH 33XTDNQg h i5 25255 1Solder CuTMAH 400K 50XTDNQg h15 65653 1Solder Cu400K PLP 30DNQg h6 25252 1Au Cu303N PLP 40DNQg h20 30302 1Au Cu303N EXP 12XT 20PCAg h i5 20203 1CuTMAH EXP 5XTCAg h i3 552 1Si Implant EtchTMAH EXP 40XTCAg h i20 100604 1Etch Solder CuTMAH 400K EXP 125nXTPPg h i20 1201205 1Cu Au SolderTMAH 303N EXP 3nXT HRCAg h i3 555 1Cu NiFe SiTMAH EXP 5nXTCAg h i5 15153 1Cu NiFe SiTMAH TX 1311CADUV3 5515 1Cu NiFe SiTMAH AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 4 MTI Flexifab coat and bake Static dispense on 6 silicon 30 sec spin indicated rpm SB 110 C in proximity 10 sec 0 050 180 sec 0 002 Spin Speed rpm Film Thickness m AZ9260 Photoresist on Silicon Film Thickness vs Spin Speed 5 6 7 8 9 10 11 12 13 14 15 10001500200025003000350040004500 AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 5 AZ 9260 Table of Contents 12 m FT Process Performance Results Pages 6 22 Ultratech 1500 with AZ 300 MIF developer 12 m FT Process Performance Results Pages 23 35 Suss MA200 with AZ 400K 1 4 Developer 24 m FT Process Performance Results Pages 36 52 Ultratech 1500 with AZ 400K 1 4 Developer 24 m FT Process Performance Results Pages 53 65 Suss MA200 with AZ 300 MIF developer AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 6 AZ 9260 Photoresist Lithographic Evaluation by Ultratech 1500 Stepper with AZ 300 MIF Developer 12 m FT Process AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 7 AZ9260 Photoresist Process Conditions Substrate Bare Silicon Coat Optitrac Static dispense Target FT 12 m Softbake 110 C hotplate 180 sec full contact Exposure Ultratech 1500 gh line Stepper FEM 1200 mJ cm2 with increments of 75 mJ cm2 Nominal Focus of 2 m in increments of 2 m in both directions Develop AZ 300MIF 2 38 TMAH continuous spray for 400 sec 23 C Analysis Amray SEM AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 8 AZ9260 Photoresist Features 1 1 Film Thickness m DTP 10 m mJ cm Exposure Latitude 10 m DOF 10 m m Linearity m Dense Lines 12 1798 106 16 0 4 0 Contact Holes 12 1539 90 8 8 10 Summary of Results AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 39 Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Ultratech 1500 gh line Stepper AZ 400K 1 4 600 sec continuous spray 27 C Exposure Dose mj cm Measured Linewidth m AZ 9260 Photoresist FT 24 m Exposure Latitude on Silicon 10 0 m L S 8 8 5 9 9 5 10 10 5 11 11 5 12 15751650172518001875195020252100217522502325 1900 mj cm 22 Exposure Latitude AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 40 1725 mJ cm 1800 mJ cm Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Ultratech 1500 gh line Stepper AZ 400K 1 4 600 sec continuous spray 27 C 2100 mJ cm 2025 mJ cm 1875 mJ cm 1950 mJ cm 2175 mJ cm 1650 mJ cm AZ 9260 Photoresist FT 24 m Exposure Latitude on Silicon 10 0 m L S AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 41 8 75 9 25 9 75 10 25 10 75 11 25 16 0 14 0 12 0 10 0 8 0 6 0 4 0 2 00 02 04 0 Focus m Measured Linewidth m AZ9260 Photoresist FT 24 m Depth of Focus 1875 mJ cm 10 0 m L S Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Ultratech 1500 gh line Stepper AZ 400K 1 4 600 sec continuous spray 27 C AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 42 12 0 m 10 0 m 8 0 m Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Ultratech 1500 gh line Stepper AZ 400K 1 4 600 sec continuous spray 27 C 0 0 m 2 0 m 4 0 m 6 0 m 14 0 m 2 0 m AZ9260 Photoresist FT 24 m Depth of Focus 1875 mJ cm 10 0 m L S AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 43 2 0 4 0 6 0 8 0 10 0 12 0 14 0 16 0 18 0 20 0 22 0 2 04 06 08 010 012 014 016 018 020 022 0 Nominal Linewidth m Measured Linewidth m AZ9260 Photoresist FT 24 m Linearity on Silicon 1875 mJ cm Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Ultratech 1500 gh line Stepper AZ 400K 1 4 600 sec continuous spray 27 C AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 44 15 m12 m10 0 m9 0 m Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Ultratech 1500 gh line Stepper AZ 400K 1 4 600 sec continuous spray 27 C 5 0 m6 0 m7 0 m 8 0 m 20 m 4 0 m AZ9260 Photoresist FT 24 m Linearity on Silicon 1875 mJ cm AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 45 Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Ultratech 1500 gh line Stepper AZ 400K 1 4 600 sec continuous spray 27 C Exposure Dose mj cm Measured Linewidth m AZ9260 Photoresist FT 24 m Exposure Latitude on Silicon 10 0 m CH 1 1 Pitch 8 8 5 9 9 5 10 10 5 11 11 5 12 15001575165017251800187519502025210021752250 1805 mj cm 30 Exposure Latitude AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 46 1650 mJ cm 1725 mJ cm Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Ultratech 1500 gh line Stepper AZ 400K 1 4 600 sec continuous spray 27 C 2025 mJ cm 1950 mJ cm 1800 mJ cm 1875 mJ cm 2100 mJ cm 1575 mJ cm 2175 mJ cm AZ9260 Photoresist FT 24 m Exposure Latitude on Silicon 10 0 m CH 1 1 Pitch AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 47 1650 mJ cm 1725 mJ cm Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Ultratech 1500 gh line Stepper AZ 400K 1 4 600 sec continuous spray 27 C 2025 mJ cm 1950 mJ cm 1800 mJ cm 1875 mJ cm 2100 mJ cm 1575 mJ cm 2175 mJ cm AZ9260 Photoresist FT 24 m Exposure Latitude on Silicon 10 0 m CH 1 0 7 Pitch AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 48 1650 mJ cm 1725 mJ cm Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Ultratech 1500 gh line Stepper AZ 400K 1 4 600 sec continuous spray 27 C 2025 mJ cm 1950 mJ cm 1800 mJ cm 1875 mJ cm 2100 mJ cm 1575 mJ cm 2175 mJ cm AZ9260 Photoresist FT 24 m Exposure Latitude on Silicon 10 0 m CH 1 0 3 Pitch AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 49 8 75 9 25 9 75 10 25 10 75 11 25 12 0 10 0 8 0 6 0 4 0 2 00 0 Focus m Measured Linewidth m AZ9260 Photoresist FT 24 m Depth of Focus 1800 mJ cm 10 0 m CH 1 1 Pitch Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Ultratech 1500 gh line Stepper AZ 400K 1 4 600 sec continuous spray 27 C AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 50 8 0 m 2 0 m 4 0 m 6 0 m 10 0 m 1 1 1 0 7 1 0 3 AZ9260 Photoresist FT 24 m Depth of Focus 1800 mJ cm 10 0 m CH Various Pitch AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 51 5 0 10 0 15 0 20 0 25 0 30 0 35 0 40 0 45 0 50 0 5 010 015 020 025 030 035 040 045 050 0 Nominal Linewidth m Measured Linewidth m AZ9260 Photoresist FT 24 m Linearity on Silicon 1800 mJ cm 40 0 m to 10 0 m Contact Holes 1 1 Pitch Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Ultratech 1500 gh line Stepper AZ 400K 1 4 600 sec continuous spray 27 C AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 52 30 m10 m20 m40 m 1 1 1 0 7 1 0 3 AZ9260 Photoresist FT 24 m Linearity on Silicon 1800 mJ cm 40 0 m to 10 0 m Contact Holes Various Pitch AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 53 AZ 9260 Photoresist Lithographic Evaluation by Suss MA200 Mask Aligner with AZ 300 MIF Developer 24 m FT Process AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 54 AZ9260 Photoresist Process Conditions Substrate Bare Silicon Coat Optitrac Static dispense Target FT 24 m Softbake 1st layer 110 C hotplate 80 sec full contact 2nd layer 115 C hotplate 180 sec full contact Exposure Suss MA200 CC Mask Aligner with 20 m proximity gap FEM 2200 mJ cm2 with increments of 200 mJ cm2 Develop AZ 300 MIF 2 38 TMAH continuous spray for 720 sec 23 C Analysis Amray SEM AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 55 AZ 9260 Photoresist Features 1 1 Film Thickness m DTP 40 m mJ cm Exposure Latitude 40 m Linearity m Dense Lines 24 2228 166 10 Contact Holes 24 1674 217 10 Summary of Results AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 56 32 34 36 38 40 42 44 46 48 9001200150018002100240027003000330036003900420045004800 Film Thickness 24 m Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Suss MA200 CC Mask Aligner 20 m proximity gap AZ 300 MIF 720 sec continuous spray 23 C Exposure Dose mj cm Measured Linewidth m AZ9260 Photoresist FT 24 m Exposure Latitude on Silicon 40 m L S 2228 mj cm 166 Exposure Latitude AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 57 1575 mJ cm 1785mJ cm 1995 mJ cm Film Thickness 24 m Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Suss MA200 CC Mask Aligner 20 m proximity gap AZ 300 MIF 720 sec continuous spray 23 C 3400 mJ cm 3000 mJ cm 2600 mJ cm 2200 mJ cm 4000 mJ cm AZ 9260 Photoresist FT 24 m Exposure Latitude on Silicon 40 m L S 2400 mJ cm 1365 mJ cm 1155 mJ cm AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 58 5 0 15 0 25 0 35 0 45 0 55 0 65 0 75 0 85 0 5 015 025 035 045 055 065 075 085 0 Nominal Linewidth m Measured Linewidth m AZ9260 Photoresist FT 24 m Linearity on Silicon 2200 mJ cm Film Thickness 24 m Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Suss MA200 CC Mask Aligner 20 m proximity gap AZ 300 MIF 720 sec continuous spray 23 C AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 59 AZ9260 Photoresist FT 24 m Linearity on Silicon 2200 mJ cm 80 m60 m50 m Film Thickness 24 m Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Suss MA200 CC Mask Aligner 20 m proximity gap AZ 300 MIF 720 sec continuous spray 23 C 10 m20 m30 m 40 m AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 60 Film Thickness 24 m Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Suss MA200 CC Mask Aligner 20 m proximity gap AZ 300 MIF 720 sec continuous spray 23 C Exposure Dose mj cm Measured Linewidth m AZ9260 Photoresist FT 24 m Exposure Latitude on Silicon 40 m Contact Holes 1 1 Pitch 32 34 36 38 40 42 44 46 48 5008001100 1400 1700 2000 2300 2600 2900 3200 3500 3800 4100 4400 4700 1674 mj cm 217 Exposure Latitude AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 61 1365 mJ cm 1470 mJ cm 1575 mJ cm Film Thickness 24 m Optitrac coat and Bake SB 1st layer 110 C 80 sec 2nd layer 115 C 180 sec Suss MA200 CC Mask Aligner 20 m proximity gap AZ 300 MIF 720 sec continuous spray 23 C 3200 mJ cm 2600 mJ cm 2100 mJ cm 1680 mJ cm 3800 mJ cm 1785 mJ cm 1260 mJ cm 1155 mJ cm AZ9260 Photoresist FT 24 m Exposure Latitude on Silicon 40 m Contact Holes 1 1 Pitch AZ the AZ logo BARLi Aquatar nLOF Kwik Strip Klebosol and Spinfil are registered trademarks and AX DX HERB HiR MiR NCD PLP Signiflow SWG and TARP are trademarks of AZ Electronic Materials page 62 1365 mJ cm 1470 mJ cm 1575 mJ cm Film Thickness 24 m Optitrac coat and Bake SB 1st layer 110 C 80 se

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