原子层沉积法的原理和应用PPT课件

,AtomicLayerDeposition(ALD),杨超、包峰、方聪、蒋博瀚、马红石李勇辉、王谦、徐晨、于浩、赵灿灿ShanghaiInstituteofCeramics,SyntheticChemistryofMaterials,Outline,Outline,1.IntroductiontoALD2.Classicalmodels:ALDofAl2O33.ALDandCVD4.ApplicationsofALD(1)Coatingsonhighaspectratiostructures(2)CoatingsonNanoparticles(3)CombinationofCNT(4)PlasmaALD5.ExpectationsandchallengeinALD,2.Classicalmodels:ALDofAl2O3,1.IntroductiontoALD,Atomiclayerdeposition（ALD）atomiclevelcontroloffilmdeposition,3.ComparisonofALDandCVD,SchematicpressureprofileduringtheALDandCVDprocess,Seung-MoLeeetal.,ChemPhysChem,12,791-798(2011),3.ComparisonofALDandCVD,1,2,M.Knaut,etal.MicroelectronEng,107,80-83(2013),4.1Coatingsonhighaspectratiostructures,4.2Coatingsonnanoparticles,XuDongWangetal.,NanolettersVol.4,No.11(2004),4.2Coatingsonnanoparticles,ALDCyclesBowlThickness,PSSpheresBowlSize,4.3CombinationofCNTandsuper-blackcoatings,SchematicillustrationoftheALDandCVDprocessforthesynthesisofCNTarrays,SchematicrepresentationofAl2O3ALDcoatingonmonodispersedNPs.,4.3CombinationofCNTandsuper-blackcoatings,KaiZhou,etal.,NanoscaleResLett,5:1555-1560(2010)XinWang,etal.,ACSAppl.Mater.Interfaces,3:4180-4184(2011),4.4MeritsofPlasma-AssistedALD,N.Leick,J.Vac.Sci.Technol.A29,021016(2011),Merits,b.DirectplasmaALD,c.RemoteplasmaALD,d.Directplasmareactorwithmesh,a.Radical-enhancedALD,4.4Plasma-AssistedALDConfigurations,AssistinganALDprocessbymeansofaplasmastep:,FigVariousreactorconfigurationsforplasma-assistedALD,N.Leick,J.Vac.Sci.Technol.A29,021016(2011),StevenM.George,ChemicalReviews,110,111-131(2010),Challenges,ControllingthedosagesDifferentmulti-metaldepositionDifferentoxidedopeddeposition,DecomposingReasonablevaporpressureReactionisbetweentheprecursorsandthematrixes,AppliedtothemassproductionLowdepositionrate100-300nm/h,5.1ChallengesofALD,ThefutureprospectsforALDareverypromising.Variousmaterialscanbedepo