表面粗糙度仪的测量系统分析

1、410.001 1 95 %.42Measuring System Analysis for Surface Profile Measuring Instruments:JB - 1C10% SfR &R= 17.9 % <30 % JB - 1C:<R&R)JB 1C1JD - 1C2008 5 23:JB 1C:3:4 0. S m< Xhu - R>:R&R<ANOVA>(1) GRR3O5J ：(2) 10%GRR30%：(3) GRR10G .3(R&R)JB - 1C310018)(R2) = 0. 9372 &g

2、t;0. 99()3. 110( )110 ,A BC3,23.2(1)249 1425 1015(2)219 ;220221226(4)D 3 D4 A 2 223 2427 28229(6)FCl K： K3,EVAVR&RPVTV.23.3Minitab0.001 1 95 %.111217293142200936:2006 72 #:Umax:2OO8 5 18:0.001 m 10 m:40.8 mI23456789103.9714. 19939984.2813.8754.0793.9014.2523.8224.2194.0124.2234.0094.2333.8484.08

3、73.9234.2653.8334.2273.9984. 2063.9874.2573.8984.0983.8734.2833.8274. 1983.9944 20939984.2573-8744.0883 8994.2673.8274.2154.06270.0410.0240.0220.048a 0500.0190 0500.0310.0110. 0290.03254.0034.3033. 8714 1883.8423.8964.0024. 1864.0124.0843.9944.2943.9094 1963.8333.8873.9494. 1943.9894.0814.0284.3103

4、8944.2043.8683.9053.9714 1793.9914.9024.0084.3023 8914. 1963-8483. 8963.9744. 18639974.0864.0385(K 034O. OlbU 03«(K 01ba 0330.0180 0530.0150.0230.01 1O 02593.8764 2983.8914.2413.9984O223.9924.0893.9064. 1733.8694.2673.9034.2034.0063.9934.0024.0843.8994. 1893.8854.2863.8734.2173.9914.0094.0184.0

5、763.8914. 1543.8774. 2843 8894.2203. 9984. 0084.0044O833. 8994. 1724.04340.0160.0310.0300.038Q0I50. 0290.0260.0130.0150. 0350 0248Xpi斗2心XmX"Xp6Xp7心心XpM)3.9604.2653.9264.2243.9073.9973.9594. 17939O84. 1574 0482Rp = max( 5Q nin(斗丿 i= 12.100. 3585:R = < Rm +心+ R )/m0 028:D4 =2 574 d3 = od4 R =0

6、.0714LO.k =D3 R =0.0000X. = 4.0627Xi, = 4. 0385X< « 4.0434:X-(X” Xh*XJ/ m 4.0482:1.0234.04824.0766UCLXLCLX= X A：4.0198AV =X*f = max( X,> - mini X) j = a . b. c:Kl= 0.5908. IQ =0.5231 Kj = 0 3146 (EV.Equpmcnt Variation)EV = R Ki =0.016(AV .ppniiscr Variation)irf K» ( EV'/ pr) =0.0

7、123<R&R>EV= ( EV/ TV)%AV = (AV/ TV)100ST = 14.3 %100 St = 10.7 %100 % = 17.9 %34PV =Rp Kj =0. 113%PV 3=(PV/TV) 100*1 =984 筑(TV. Total Variation)35TV= (R &R* (PV) 2 = 0. 115:mPr:5. 15(99. 0 »)(PV . Part - to- Part Variation)43R&R% 17.9 %,#SPC,80 %#:、tts1 23456789 10件0曹-*-CUR&am

8、p;R%17. 9 % ,400200000800 I w4 4 4 3 、«£电«-<-LUir-»-B-H-CLX -h-UCLI -Lax.JB - 1C(),in UI.20078(4):28O28412) R&Rui.2003 .6(1) :6266.|3|Minith【".2005 (4)442325.|4) Helen Liu Qithy Jblt Sam Evans. Accuracy and rcpcatahilily of an optical TOtbn analysis system for measuring small deform)tions cf hiologicai tissues|J ournal of Bbmxhanics 2007 .40:210214.:3IOO18310018):2008 10 1040 )C(l/5 KNlnO4) = m 1000/ ( vv