原子层沉积法的原理和应用ppt课件

1、,Atomic Layer Deposition (ALD),杨 超、包 峰、方 聪、蒋博瀚、马 红石 李勇辉、王 谦、徐 晨、于 浩、 赵灿灿 Shanghai Institute of Ceramics,Synthetic Chemistry of Materials,Outline,Outline,1.Introduction to ALD 2.Classical models: ALD of Al2O3 3.ALD and CVD 4.Applications of ALD (1)Coatings on high aspect ratio structures (2)Coatings

2、on Nanoparticles (3)Combination of CNT (4)Plasma ALD 5. Expectations and challenge in ALD,2. Classical models: ALD of Al2O3,1. Introduction to ALD,Atomic layer deposition （ALD） atomic level control of film deposition,3. Comparison of ALD and CVD,Schematic pressure profile during the ALD and CVD proc

3、ess,Seung-Mo Lee et al., ChemPhysChem, 12, 791-798(2011),3. Comparison of ALD and CVD,1,2,M. Knaut, et al. Microelectron Eng, 107, 80-83 (2013),4.1 Coatings on high aspect ratio structures,4.2 Coatings on nanoparticles,Xu Dong Wang et al., Nano letters Vol.4,No.11 (2004),4.2 Coatings on nanoparticle

4、s,ALDCycles BowlThickness,PS Spheres Bowl Size,4.3 Combination of CNT and super-black coatings,Schematic illustration of the ALD and CVD process for the synthesis of CNT arrays,Schematic representation of Al2O3 ALD coating on monodispersed NPs.,4.3 Combination of CNT and super-black coatings,Kai Zho

5、u, et al., Nanoscale Res Lett, 5:1555-1560(2010) Xin Wang, et al., ACS Appl. Mater. Interfaces,3: 4180-4184 (2011),4.4 Merits of Plasma-Assisted ALD,N. Leick, J. Vac. Sci. Technol. A 29, 021016 (2011),Merits,b. Direct plasma ALD,c. Remote plasma ALD,d. Direct plasma reactor with mesh,a. Radical-enha

6、nced ALD,4.4 Plasma-Assisted ALD Configurations,Assisting an ALD process by means of a plasma step:,Fig Various reactor configurations for plasma-assisted ALD,N. Leick, J. Vac. Sci. Technol. A 29, 021016 (2011),Steven M. George, Chemical Reviews,110,111-131( 2010),Challenges,Controlling the dosages

7、Different multi-metal deposition Different oxide doped deposition,Decomposing Reasonable vapor pressure Reaction is between the precursors and the matrixes,Applied to the mass production Low deposition rate 100-300nm/h,5.1 Challenges of ALD,The future prospects for ALD are very promising. Various materials can