Pilkington浮法玻璃生产介绍.ppt

1、A member of NSG Group,2,Application of Inorganic Chemistry in Industry,Flat Glass and Coatings On Glass Dr Troy Manning Advanced Technologist, On-line Coatings Pilkington European Technical Centre Hall Lane Lathom UK ,3,Outline,Overview of Flat Glass industry and NSG/Pilkington Flat Glass manufactur

2、e Float Glass Process Coating technology within the glass industry Chemical Vapour Deposition Examples of on line coating applications Low Emissivity/Solar Control Self Cleaning Summary Suggested Reading,4,Global Flat Glass Market,Global Market 37 million tonnes (4.4 billion sq. m) Building Products

3、 33 m tonnes - Automotive 4m tonnes Of which 24 million = high quality float glass 3 million = sheet 2 million = rolled 8 million = lower quality float (mostly China) Global Value At primary manufacture level 15 billion At processed level 50 billion,5,NSG and Pilkington combined,A global glass leade

4、r the pure play in Flat Glass Combined annual sales c. 4 billion Equal to Asahi Glass in scale, most profitable in Flat Glass Ownership/interests in 46 float lines 6.4 million tonnes annual output Widened Automotive customer base 36,000 employees worldwide Manufacturing operations in 26 countries Sa

5、les in 130+ countries,6,Manufacture of Flat Glass,Four main methods Plate Glass (1688) molten glass poured on to a flat bed, spread, cooled and polished Sheet Glass (1905) continuous sheet of glass drawn from tank of molten glass Rolled Glass (1920) molten glass poured onto to two rollers to achieve

6、 an even thickness, making polishing easier. Used to make patterned and wired glass. Float Glass (1959) molten glass poured onto bed of molten tin and drawn off in continuous ribbon. Gives high quality flat glass with even thickness and fire polish finish. 320 float-glass lines worldwide,7,Melting f

7、urnace,Float bath,Cooling lehr,Continuos ribbon of glass,Cross cutters,Large plate lift-off devices,Small plate lift-off devices,Raw material feed,The Float-Glass Process,Operates non-stop for 10-15 years 6000 km/year 0.4 mm-25 mm thick, up to 3 m wide,8,The Float Glass Process,9,Raw materials,10,Me

8、lting Furnace,11,Float Bath,12,Float Glass Plant,13,The Float-Glass Process,Fine-grained ingredients, closely controlled for quality, are mixed to make batch, which flows as a blanket on to molten glass at 1500 C in the melter. The furnace contains 2000 tonnes of molten glass.,After about 50 hours,

9、glass from the melter flows gently over a refractory spout on to the mirror-like surface of molten tin, starting at 1100C and leaving the float bath as a solid ribbon at 600C.,Despite the tranquillity with which float glass is formed, considerable stresses are developed in the ribbon as it cools.,14

10、,Raw Materials,Oxide % in glass Raw material source SiO272.2Sand Na2O13.4Soda Ash (Na2CO3) CaO8.4Limestone (CaCO3) MgO4.0Dolomite (MgCO3.CaCO3) Al2O31.0Impurity in sand, Feldspar or Calumite Fe2O30.11Impurity in sand or Rouge (Fe2O3) SO30.20Sodium sulphate C0.00Anthracite,15,Raw materials,SiO2Very d

11、urable, BUT high melting point (1700C)! + Na2OMelts at a lower temperature, BUT dissolves in water! + CaOMore durable, BUT will not form in bath without crystallisation + MgOGlass stays as a super-cooled liquid in bath, no crystallisation + Al2O3Adds durability + Fe2O3Adds required level of green co

12、lour for customer,16,Chemistry of Glass,Important glassmaking chemistry: basic reactions Na2CO3 + SiO2 1500C Na2SiO3 + CO2 Na2SiO3 + x SiO2 Na2SO4 (Na2O)(SiO2)(x+1),Digestion,17,Composition of Glass,18,Structure of Glass,Random network of SiO4- tetrahedral units. Na-O enter Si-O network according to

13、 valency Network Formers Ca and Mg Network Modifiers make structure more complex to prevent crystallisation,19,Body-tinted Glass,20,CIE L a* b* colour space,21,CIE L a* b* colour space,22,Functions of a Window,Light in homes, offices Light out shops, museum displays Heat in heating dominated climate

14、s Heat out cooling dominated climates Can change properties of glass by applying coatings to the surface,23,Making a window functional - coatings,A wide variety of coating technologies are utilised by the glass industry Spray Pyrolysis Powder Spray Chemical Vapour Deposition Sputter Coating Thermal

15、Evaporation Coatings Sol Gel Coatings These are applied On Line i.e. as the glass is produced on the float line Off Line i.e. coating not necessarily produced at the same location,24,Variations of CVD,Atmospheric Pressure APCVD Low Pressure - LPCVD Aerosol Assisted - AACVD Metalorganic MOCVD Combust

16、ion/Flame CCVD Hot Wire/Filament HWCVD/HFCVD Plasma Enhanced - PECVD Laser Assisted LACVD Microwave Assisted MWCVD Atomic Layer Deposition ALD,25,Chemical Vapour Deposition,26,Chemical Vapour Deposition,Main gas flow region,Gas Phase Reactions,Surface Diffusion,Desorption of Film Precursor,By Produc

17、ts,Diffusion to surface,27,Chemical Vapour Deposition,Animation kindly supplied by Dr. Warren Cross, University of Nottingham,28,CVD processes and parameters,29,CVD Precursor Properties,Volatile gas, liquid, low melting point solid, sublimable solid Pure Stable under transport React/Decompose cleanl

18、y to give desired coating minimise contaminants Can be single source or dual/multi-source,30,CVD Precursors,Single Source pyrolysis (thermal decomposition) e.g Ti(OC2H5)4 TiO2 + 4C2H4 + 2H2O (400 C) Oxidation e.g SiH4(g) + O2(g) SiO2(s) + 2H2(g) Reduction e.g. WF6(g) + 3H2(g) W(s) + 6HF(g) Dual sour

19、ce e.g. TiCl4(g) + 4EtOH(g) TiO2(s) + 4HCl(g) + 2EtOEt(g),31,Dual Source and Single Source Precursors,32,Transport of Precursors,Bubbler for liquids and low melting solids,Direct Liquid Injection syringe and syringe driver for liquids and solutions Sublimation for solids hot gas passed over heated p

20、recursor Aerosol of precursor solutions,33,Effect of Temperature on Growth Rate,Independent of temperature,34,Flow conditions,Laminar Flow regime,Turbulent Flow Regime,35,Reynolds Number,Dimensionless number describing flow conditions,r = Mass density related to concn and partial pressure u = averag

21、e velocity = viscosity L = relevant length, related to reactor dimensions,If Re 1000 fully turbulent flow Reality is between the two extremes,36,Dimensionless Numbers,Reduces the number of parameters that describe a system Makes it easier to determine relationships experimentally For example: Drag F

22、orce on a Sphere Variables: Force = f (velocity, diameter, viscosity, density) Can be reduced to 2 “dimensionless groups”: Drag coefficient (CD) and Reynolds number (Re),37,Dimensionless Numbers,Laminar flow regime,Turbulent flow regime,Experimental values of CD for spheres in fluid flows at various

23、 Re,38,Boundary Layer gas velocity,Frictional forces against reactor walls decrease gas velocity,The boundary layer thickness can be estimated from:,39,Boundary Layer - temperature,Contact with hot surfaces increases temperature,40,Boundary Layer precursor concentration,Depletion of precursor decrea

24、ses gas phase concentration,41,Nucleation and Growth,Van der Waals type adsorption of precursor to substrate,Precursors then diffuse across surface,Precursors diffuse across boundary layer to surface,And can be desorbed back into main gas flow,Or can find low energy binding sites to coalesce into fi

25、lm,Main Gas Flow,42,Nucleation and Growth,43,Growth Mechanisms,(b) Frank - van der Merwe,Layer growth,(c) Stranski - Kastanov,Mixed layered and island,growth,(a) Volmer - Weber,Island growth,44,Thin Film Analysis,Many techniques are used to characterise thin films Examples include XRD crystallinity,

26、 phase XRR layer thickness, layer roughness SEM/EDX/WDX morphology, thickness, composition Raman phase, bonding FTIR phase, bonding XPS composition, depth profiling, doping SIMS composition, depth profiling, doping AFM roughness, surface morphology TEM crystalline structure, crystal defects Analysis

27、 of functional properties,45,CVD on Glass,For on-line coating of glass we require: High growth rates required thickness in 2 s Stable chemistry uniform coatings for continuous operation for many days Good adhesion to glass High efficiency reduce costs,46,APCVD Strengths and Weaknesses,47,On-Line Coa

28、ting Positions,Load raw materials,48,Laminar Flow CVD Coater,49,APCVD Applications on Glass,Coating technology allows us to add functionality to glass Coating technology is today used for a variety of products Low Emissivity coatings to reduce heating bills Solar Control coatings to reduce solar hea

29、t gain Technical products e.g. TCOs for LCD displays, solar cells Anti-Reflective Products Hydrophobic Coatings Self Cleaning Coatings Smart Coatings e.g. electrochromics, thermochromics, photochromics,50,Low-Emissivity Coatings,Designed to reduce heating bills,In a double glazed unit, a low-emissiv

30、ity coating on the inner pane blocks radiative heat trying to escape into the cavity,51,Emissivity,Emissivity is the ratio of radiation emitted by a blackbody or a surface to the theoretical radiation predicted by Plancks law. Surface emissivity is generally measured indirectly by assuming that e=1-

31、reflectivity, usually at a specified wavelength,52,Solar Spectrum,We have to distinguish between : what comes from the outside to the inside solar spectrum what goes from the inside to the outside - heat,Visible light,Infra-Red,UV,53,Outside to Inside,Optimal curve for solar control - no UV - all vi

32、sible light pass - no IR,Optimal curve for low-e - no UV - all visible light pass - all IR pass,54,Inside to Outside No Glazing,55,Inside to Outside Low-e Coated Glass,Low emissivity coated products limit the black body radiation i.e. the energy losses through the window: K-Glass e=0.15,56,Transpare

33、nt Conducting Oxides,Doped metal oxides displaying n-type conductivity F- substitutes for O2- in the SnO2 lattice releasing an electron into the conduction band i.e. Sn4+O2-2-xF-xe-x Close to metallic conductivity (15 W/) can be achieved but with high optical transmittance (band gap 4 eV),C. G. Gran

34、qvist, Adv. Mater., 2003, 15, 1789-1803,57,CVD of SnO2:F,SnCl4 + H2O + HF SnO2:F + HCl (1.5 at% F) Much gas phase reaction Gases introduced separately in turbulent flow regime Very high growth rates 100 nm/s possible Low precursor efficiency 10%,SiCxOy (70 nm),SnO2:F (350 nm),Glass,SiH4 + C2H4 + CO2

35、 SiCxOy + H2O + other by-products Used as colour suppression and barrier layer,58,Low Emissivity Coating,Generally based on SnO2:F (Transparent Conductive Oxide) SiCO under layer used as colour suppressant,59,Low-E and Solar Control Coatings,60,Self-Cleaning Glass,Two mechanisms: Super hydrophilicit

36、y Photocatalytic degradation of organic matter. TiO2 coating,61,Superhydrophilicity,Oxygen vacancies,O,H,O,O,O,O,H,H,H,2,O,(,O,H,-,H,+,),Water droplets,Uniform water film,UV illumination time,Contact angle,o,o,o,o,o,o,o,dark,UV,62,Photocatalytic Activity,Ultra band gap irradiation of TiO2 Generation

37、 of electron hole in valence band Hole migrates to the surface and results in oxidation of organic material,63,Semi-conductor Photocatalysis,A. Mills, S Le Hunte, J. Photochem. Photobiol A, 1997, 108, 1-35.,64,CVD of ActivTM,SiO2 (30 nm),TiO2 (17 nm),Glass,SiH4 + O2 + C2H4 SiO2 + by-products Used as barrier layer to prevent diffusion of Na ions into TiO2 layer,TiCl4 + EtOAc TiO2 + HCl + organic by-products,Laminar Flow regime Reasonable growth rates and precursor efficiency,65,ActivTM,66,ActivTM,67,ActivTM,68,Superhydrophilicity,15 mins UV Exposure,30 mins UV Exposure,45 mins UV Expos