金属薄膜电阻率实验数据.doc

金属薄膜电阻率实验数据一、实验测量及数据处理：数据记录表格金属薄膜电阻率测量数据记录表(溅射时间4min)膜厚d=532.8*10-10m电流I/mA正向电压V+/mA负向电压V-/mV平均电压V/mV0.35140.427-0.4250.4260.44670.542-0.540.5410.56250.682-0.6810.68150.68850.835-0.8330.8340.79950.992-0.9890.99050.95691.187-1.1841.18551.4591.806-1.8081.8072.9513.652-3.6543.6533.6434.51-4.5114.5105金属薄膜电阻率测量数据记录表(溅射时间8min)膜厚d=1065.6*10-10m电流I/mA正向电压V+/mA负向电压V-/mV平均电压V/mV0.72940.184-0.1860.1851.65180.418-0.420.4192.9650.752-0.7520.7524.641.177-1.1771.1777.9382.014-2.0152.014510.1282.57-2.572.5711.4012.893-2.8932.89313.8883.524-3.5253.524516.7034.238-4.2394.2385金属薄膜电阻率测量数据记录表(溅射时间12min)膜厚d=1598.4*10-10m电流I/mA正向电压V+/mA负向电压V-/mV平均电压V/mV1.8670.207-0.2070.2076.20.684-0.6840.68412.071.328-1.3291.328517.31.906-1.9051.905520.632.27-2.2722.27124.512.698-2.6982.69827.373.013-3.0153.01432.843.615-3.6153.61538.944.284-4.2884.286金属薄膜电阻率测量数据记录表(溅射时间20min)膜厚d=2664*10-10m电流I/mA正向电压V+/mA负向电压V-/mV平均电压V/mV4.5610.253-0.250.25158.9360.494-0.4910.492516.420.906-0.9040.90521.281.174-1.1761.17535.591.962-1.9561.95946.732.576-2.5812.578552.642.906-2.9042.90556.43.11-3.1123.11166.323.657-3.6583.6575金属薄膜电阻率测量数据记录表(溅射时间25min)膜厚d=3330*10-10m电流I/mA正向电压V+/mA负向电压V-/mV平均电压V/mV0.79840.03-0.030.031.2630.048-0.0470.04753.430.13-0.1290.12956.2790.238-0.2370.23755.4720.226-0.2240.22510.2430.423-0.4210.42213.1390.497-0.4960.496527.081.12-1.1161.11850.832.097-2.0952.096Excel处理的电压随电流变化的关系图： 由F=ln2VId，根据已经处理得到的V/I,代入求得F：d/mV/IF/*m5.328E-081.2372.98716E-071.0656E-070.25381.22577E-071.5984E-070.11017.97622E-082.664E-070.05526.66496E-080.0000003330.0416.18803E-08F-d的图像：二、讨论：本实验中采用测