原子层沉积法的原理和应用ppt课件.ppt

AtomicLayerDeposition ALD 杨超 包峰 方聪 蒋博瀚 马红石李勇辉 王谦 徐晨 于浩 赵灿灿 ShanghaiInstituteofCeramics SyntheticChemistryofMaterials Outline Outline 1 IntroductiontoALD2 Classicalmodels ALDofAl2O33 ALDandCVD4 ApplicationsofALD 1 Coatingsonhighaspectratiostructures 2 CoatingsonNanoparticles 3 CombinationofCNT 4 PlasmaALD5 ExpectationsandchallengeinALD 2 Classicalmodels ALDofAl2O3 1 IntroductiontoALD Atomiclayerdeposition ALD atomiclevelcontroloffilmdeposition 3 ComparisonofALDandCVD SchematicpressureprofileduringtheALDandCVDprocess Seung MoLeeetal ChemPhysChem 12 791 798 2011 3 ComparisonofALDandCVD 1 2 M Knaut etal MicroelectronEng 107 80 83 2013 4 1Coatingsonhighaspectratiostructures 4 2Coatingsonnanoparticles XuDongWangetal NanolettersVol 4 No 11 2004 4 2Coatingsonnanoparticles ALDCycles BowlThickness PSSpheres BowlSize 4 3CombinationofCNTandsuper blackcoatings SchematicillustrationoftheALDandCVDprocessforthesynthesisofCNTarrays SchematicrepresentationofAl2O3ALDcoatingonmonodispersedNPs 4 3CombinationofCNTandsuper blackcoatings KaiZhou etal NanoscaleResLett 5 1555 1560 2010 XinWang etal ACSAppl Mater Interfaces 3 4180 4184 2011 4 4MeritsofPlasma AssistedALD N Leick J Vac Sci Technol A29 021016 2011 Merits b DirectplasmaALD c RemoteplasmaALD d Directplasmareactorwithmesh a Radical enhancedALD 4 4Plasma AssistedALDConfigurations AssistinganALDprocessbymeansofaplasmastep FigVariousreactorconfigurationsforplasma assistedALD N Leick J Vac Sci Technol A29 021016 2011 StevenM George ChemicalReviews 110 111 131 2010 Challenges ControllingthedosagesDifferentmulti metaldepositionDifferentoxidedopeddeposition DecomposingReasonablevaporpressureReactionisbetweentheprecursorsandthematrixes AppliedtothemassproductionLowdepositionrate100 300nm h 5 1ChallengesofALD ThefutureprospectsforALDareverypromising Variousmaterialscanbedeposited