FAB4-Litho-Reticle-Basic教学讲解课件

PreparedbyPorpoise19thJun.2005FAB4LithoReticleBasicTrainingContents

ReticleBasicReticleInspectionReticleManagementOCAPDefectReviewQ&AReticleBasicReticleorMaskReticleStructureReticleTypesPellicleandFunctionSMICReticleLayoutMixingRunCriteriaReticleOrientationinM/CReticlePodReticleBasic:ReticleorMaskMask:Aglassplatecoveredwithanarrayofpatternsusedinthephotolithography.Amask’spatternsarethesamesizeasthefinalsizeofthepatternonthewafer.Reticle:Areproductionofthepatterntobeimagedonthewafer(ormask)byastep-andrepeatprocessTheactualsizeofthepatternonthereticleisusuallyseveraltimesthefinalsizeofthepatternonthewafer.Difference:Areticleisdifferentfromamaskonlyinrespecttothesizeofthepattern.ReticleBasic:ReticleStructureQuartz:Verylowthermalcoefficient;hightransmissionfor193nmwavelengthandaboveDoubleSideadhesivePellicleMembrane:nitrocellulose;thickness2~5um;hightransmissionrateforspecificwavelengthPellicleFrame:frameheight5~6.3mm;AluminumAlloyCrorMoSixReticleBasic:ReticleTypesGenerallyreticlecanbeclassifiedasBIMandPSMmasks.AlternatingPSMAttenuatedPSMConventionalmaskEfieldonmaskEfieldonwaferIntensityonwaferNormalresolution,easytomanufacturing,lowercostHighresolution,goodforcontacthole,highercostHighresolution,butmasktoolingprocessisverycomplicated,highercostPhaseShiftMaskBInaryMaskReticleBasic:ReticleTypesAlternativePSM(Levensontype)AttenuatedPSM(Half-tonetype)PSMStrongWeakEmbeddedRim-shifterQuartzSpin-on-glassOutriggerChromelessReticleBasic:PellicleandFunctionWhydoweneedit?TopContaminantObjectPlanePellicleFilmBottomContaminantContaminantonPatternPlaneLenSystemUnfocusedTopContaminantImageUnfocusedBottomContaminantImageImagePlaneFocusedContaminantImageonWaferMaskPatternWaferSurfaceLightReticleBasic:PellicleandFunctionReticleBasic:SMICReticleLayoutCanonalignmentCanon

barcodeASMLbarcodeDateReticletitle/HRCClearoutwindowASMLpre-alignmentASMLalignmentSMIClogReleasePinR3R4R1R2ChromesidedownReticleBasic:SMICReticleLayoutReticleBasic:MixingRunCriteriaForWavelength:Resolution,pellicletype,pellicleheight193nmpelliclecanbeusedto248nmDUVandI-Linetools,butI-Linepelliclescannotbeusedon248&193nmtoolsduetotransmissionandpelliclelifetimeconcerns.

ForScannertype:

ReticlealignmentmarkASML:PA,MA,TISCanon:S-FRA(3)WaferalignmentmarkASML:PA,XPA,SPM,VSPM,SSPM,NSSM,NVSMCanon:XY8,XY6,XY4,20P4F(D)ReleasePin:ASMLonlyBarcode:positiondifferenceForprocess:Resolution,OPC,etcReticleBasic:ReticleOrientationinM/CASMLCanonReticleonScannerWaferinScannerChromesidedownReticleBasic:MixingRunCriteriaSMIConlyhave2typesinglereticlepodforproduction.ReticleInspectionInspectionToolSLF27PrinciplesMonitorItemsInspectionFrequencyParticlespecReticleInspection:InspectionToolTwobasicmaskinspectiontoolwereusedinFAB4:ZarisandSLF27.Zarisisasemi-autotoolwhichintegratedmacroinspection,N2particlecleanreticleexchangeandpelliclemountingfunction.Inspectobject:GlassandpelliclesurfaceparticleSTARLight

isamaskinspectiontoolwhichuseSimultaneousTransmittedAndReflectedLight

defectinspectiontechnology.Inspectobject:ChromeorMoSixside(D2D,SL)softdefectandharddefect,glassandpelliclesurfaceparticleReticleInspection:SLF27PrinciplesPrincipleofDefectInspection:InspectionMethodsDietoDatabase

ComparetheliveimageswithDatabaseDietoDie

Comparethetwoadjacentdiesandshowthedifference

STARLightinspectionComparetheimageswithtransmittedandreflectedlightURSA:UnpatternedReticleSurfaceAnalysis

Dark-fielddefectpreviewonpelliclesandglass.ReticleInspection:SLF27PrinciplesDietoDatabaseDatabaseLiveImagePatternimageofdatabaseLiveimageinmemoryImageComputerComparisonCancatchdifferencebetweentwoversionmasksCancatchdefectsonscribelaneCaninspecteverymask(withdatabase)HigherinspectionfalsedefectrateReticleInspection:SLF27PrinciplesDietoDieLiveimageLiveimageImageComputerdefectdetectionHigheraccuracyonCDtoleranceerrorLowerinspectionfalsedefectrateCannotcatchdifferencebetweentwoversionCannotcatchdefectsonscribelaneCannotinspectthemaskwithoutrepeatdieReticleInspection:SLF27PrinciplesSTARLightinspectionComparetheimagesoftransmitlightwithreflectedlightCancatchsoftdefectsCaninspecteverymaskCannotcatchharddefectonmaskifitisbigenough2particlesInspectionArea01TransmittedSignal01Reflected

SignalT+R01Transmitted+ReflectedSLthresholdlevelDefectsReticleInspection:SLF27PrinciplesURSA:UnpatternedReticleSurfaceAnalysisCombinedwithSTARlightinspectschrome,glass,andbothpelliclesurfacesSensitivity4µm~2minutes/surfaceDark-fielddefectpreviewonpelliclesandglass,whileURSAorSTARlightinspectionsinprogressDefectrevieworderfromlargesttosmallestBright-field,reflected-lightreviewmicroscopeforlivereviewaftercompletionofinspectionyUseradjustablesizingboxfordefectmeasurementDefectcoordinatesreferencedtoSTARlightreferenceViewreticlepatternunderadefectonpellicleorglassReticleInspection:SLF27PrinciplesSLF27SystemOverview:LaserScanningSystemReticleInspection:SLF27PrinciplesDietoDieinspectionandSTARLightinspectionmethodcanbeconductedrespectivelyandcancombined(Combomethod)themalso.Itbenefitstohighthroughput.SLF27SystemOverview:AlgorithmReticleInspection:SLF27PrinciplesThereticleismovingwiththereticlestageandtheopticallenssystemwhilescanning.Threebeamsscansimultaneouslyinfavorofthroughput.Scanningspeedisrelatedtoscanmode(Pixels)andalgorithm.SLF27SystemOverview:ScanningModeReticleInspection:SLF27PrinciplesStandardmasksisusedtomonitorthemachinestatusandmachine’sdefectcaptureability,whichincludessomespecificdefectandthedefectcounts,theircoordinate,defecttypesareexactlydefined.SLF27SystemOverview:InspectionCapacityReticleInspection:MonitorItemsZaris:DryrunparticleReticle:P4DOT6-CHKAA-2JB

Particlecount(前值)Particlecount(后值)Particlecount(net)≤10um10~50um≥50um≤10um10~50um≥50um≤10um10~50um≥50um≤10≤20≤11≤20≤100ZarisparticlemonitorspecReticleInspection:MonitorItemsSLF27:DD,SL,URSASLF27monitorspecReticleInspection:InspectionFrequencySLF27:DD&SLroutineinspectionforhazecheckbasedonwafercountandhazestatus.ReticleInspection:ParticlespecReticleManagement:ResponsibilityReticleOperationFlowReticleNameRuleOperationRulesRTMSReticleManagement:ResponsibilityMFG：光罩的日常管理、日常检查、光罩机台的Monitor、光罩机台的日常清理。新进光罩的接收。LithoPE：确定光罩管理的规则、注意事项。O.I.的编制和更新。负责对MFG人员的Training和Certify。QE：新进光罩的IQC，光罩返还Customer时的检查。光罩外送时的包装。PIE：制定光罩或产品的使用计划。ReticleManagement:ReticleOperationFlowShippingCassetteReticleStockerZaristodoN2cleaningNG,particlesRejectandSendtoMaskshoporcustomerReticleIncomingQualityCheckFlowZarismacroinspectionandpodexchangeSLF27Inspection(D2D,STARLightandURSA)ReleasetoFABOKOKNGOKOKNG,fataldefectReticleManagement:ReticleOperationFlowReticleStockerZaristodoN2cleaningSendtoRepairReticleInspectionFlowDuringtheProductionParticlecheckScannerExposureReleasedReticlesOKOKOKParticlecheckCheckScannerstatusandreticlesendtocleanorrepairNGNGNG**:SLorDDinspectionmaybeaddedtocheckhazegrowthReticleManagement:ReticleNameRuleReticleManagement:ReticleNameRuleReticleManagement:OperationRules光罩Title必须与光罩POD上的标签一致FAB内光罩的Title是唯一的，没有相同的两块光罩Run货前后，更换机台都需要做Zarisbrightlight的检查;如果两次run货之间间隔时间<Qtime(12小时),可以不做Zaris的MacroInspection，但在Qtime之内，如果要放入stock(N2Box)或change机台run，必须进行检查。如果发现同一机台unload下的光罩，两块以上均发现相似问题（SurfaceParticle，Scr