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1、先进表面工程技术,目的,提高耐磨性 提高耐腐蚀性 提高疲劳性能 提高表面其它性能 装饰性 功能性,表面工程技术分类,利用材料自身性质 形变强化 相变强化 表面涂层技术 热喷涂 电化学处理:电镀,化学镀,化学转化膜技术 气相沉积技术 表面合金化技术 化学热处理技术 激光表面合金化技术 离子注入合金化技术 复合表面改性技术,主要内容,表面涂层技术 电子束表面技术 激光束表面技术 离子束表面技术,涂层技术(coatings),1 The concept of coatings,Isolating the organism from the environment Providing contact
2、between the organism and the environment Skin 1950s: A layer of material formed naturally or synthetically or deposited artificially on the surface of an object made of another material,with the aim of obtaining required technical or decorative properties.,2. Structure of the coating,Single layer co
3、ating Single constituent coatings(单组成涂层Cr, TiN) Multi-component coatings(多组元涂层TiAlN) Multiple coating Sandwich coating (夹层Ni-Cr-Ni-Cr) Self-stratifying paint(自成层涂料,有底层和顶层之分) Thickness: hundredths of a micrometer to several millimeters,Types of coatings,Division of coatings by materials Metallic coat
4、ings Zn,Ni,Al,Cu.(金属) Pb-Sn-Cu,Sn-Ni, W,Co, Ni-Cr-Al-Y(合金) Non-metallic coatings Paints(涂料) Varnishes(清漆) Resins(树脂) Waxes(打腊) Lubricants(润滑剂) Vitreous enamels(搪瓷、珐琅) Metal ceramics(金属陶瓷) Ceramic materials(陶瓷材料),Types of coatings,Classification of coatings by application Protective coatings(防腐,厚) De
5、corative coatings(装潢,薄) Protective-decorative coatings(防腐兼装潢) Technical coatings(物理、机械、电学和热学性能),Types of coatings,Classification of coatings by manufacturing methods Galvanizing(电镀和化学镀) Immersion coatings (浸镀) Spray coatings (喷涂) Cladded coatings (覆层) Crystallizing coatings(结晶沉积),Potential propertie
6、s of coatings,Geometrical parameters of coatings Thickness Roughness Unevenness Defects,Glow discharge methods and CVD technology,Nitriding Carburizing Carbonitriding Sulfonitriding Boriding Siliciding Plasma assisted chemical vapour deposition,Glow discharge,Ion sputtering,Glow discharge furnace,Gl
7、ow discharge application,Glow discharge nitriding Glow discharge boriding,CVD methods,Vacuum deposition by physical techniques (PVD),Classification of PVD techniques,Thermal evaporation(热蒸镀) Sputtering(溅射) Ion plating(离子镀),Discussion of more important PVD techniques,Techniques utilizing simultaneous
8、 evaporation of substrate from entire liquid surface,Activate reactive evaporation Bias activated reactive evaporation Thermo-ionic arc evaporation Hot hollow cathode discharge Ionized cluster beam deposition,Techniques utilizing local evaporation,Arc evaporation Cathode spot arc evaporation Pulse p
9、lasma method Laser beam evaporation,Technique utilizing direct sputtering,Diode sputtering Triode sputtering Hollow cathode sputtering Electron cyclotron resonance sputtering Ion sputtering Magnetron sputtering,Technique utilizing deposition from ion beams,Ion beam deposition Ion mixing,Equipment fo
10、r coating deposition by PVD techniques,Vacuum chamber Deposition heads Systems for formation and sustaining of vacuum Systems for supply of reactive gases Electrical and magnetic systems Auxiliary components(heating) Systems for fixturing and displacement of the load Control system,Coatings deposite
11、d by PVD techniques,Coating materials Metallic Covalent Ion or heteropolar, electrovalent, polar(极性),Type of coatings,Control of structure and properties of coatings,Models of coating deposition,Tribological properties,Anti-corrosion properties,2.电子束表面技术,2.1电子束表面快速加热技术,2.2电子束表面合金化技术,2.3电子束表面技术的应用,3.
12、激光表面合金化,激光表面加热技术的应用,4.离子注入表面改性技术,离子注入原理,注入离子的能量损失,射程分布,表面溅射,辐照损伤,辐照损伤,离子注入模型,离子注入表面改性机理,辐照损伤,形成大量缺陷 弥散强化,形成化合物质点 喷丸作用,离子轰击 表面压缩,单位体积内原子数目增加,表面形成非晶态 降低摩擦系数 提高表面强度,提高耐磨性 提高疲劳性能 提高表面耐腐蚀性,等离子体基离子注入,Ion sheath evolution,HV,V0,0,How does the sheath evolve and the plasma replenish inside a pipe?,Process of
13、 ion sheath evolution model,Plasma refill after pulse,Development of Plasma-based Ion Implantation Techniques in China,Plasma based ion implantation in China,Harbin / R2,Beijing / R2,Dalian / R1,Shanghai / R3,Chengdu / R2,Shenzhen / C1,Hongkong / R1,7 Cities / 12 Groups R Research C Company,Typical
14、Facilities,Plasma Source,Schematic diagram of the microwave ECR PBII apparatus,Schematic diagram of the RF and filaments PBII apparatus,Plasma Density,Plasma Density,Gaseous elements implanted by PBII,The TEM of AlN precipitates of 2014 aluminum alloys sample implanted with nitrogen,Variation in rel
15、ative wear resistance with nitrogen ions dose,The depth profile of nitrogen in the ion implanted layer,Gaseous elements implanted by PBII,The nitrogen concentration, surface hardness and wear resistance of Ti6Al4V implanted with nitrogen by PBII,60kV, 120min,60kV, 90min,30kV, 90min,0.03m/s,0.06m/s,I
16、nner surface implantation,With anode,Without anode,Metal plasma-based ion implantation (MePBII),The schematic drawing of UBM MePBII,The profiles of Cu in surface layer,Metal plasma-based ion implantation (MePBII),Oscilloscope traces of (a) arc current, and (b) implantation voltage pulse and implanta
17、tion current during MePBII,The schematic drawing of MEVVA MePBII,Metal plasma-based ion implantation (MePBII),Coefficient of friction curves of the 9Cr18 samples,AES depth profile of 9Cr18 implanted with Ti and N,Plasma-based Ion Implantation and Deposition (PBII (b) Sample without the composite coa
18、ting,Schematic illustration of PBII&D set-up,Plasma-based Ion Implantation and Deposition (PBII&D),Elevated temperature PBII,The microstructure of elevated temperature implantation with nitrogen on the ion substrate(35kV),300,330,390,GXRD spectra of iron surface layer implanted with nitrogen ions at
19、 15kV, 360C,The effect of the implantation voltage on the microstructure of the nitrided layers,15kV,45kV,25kV,35kV,The surface morphology of implanted surface,15kV,45kV,Elevated temperature PBII,Ra,m,Implanted temperature,,35kV, 360,45kV, 360,35kV, 390,Implanted voltage,kV,Ra,m,Elevated temperature PBII,Concentration, hardness, wear resistance and corrosion resistance of the elevated temperature PBII surface,Elevated temperature PBII,Phase component, microhardness, modulus and wear resistance analysis of 2024 aluminum alloy implanted with nitrogen ions at different implantat
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