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DeutscheBankResearch
NorthAmerica
UnitedStates
TMT
SemicapEquipment
Industry
USSemicapEquipment
1Q26Preview:Doesitgetanybetterthanthis?
WithSemicapsharesalreadyup~50%YTDthisyear,investorsarenowincreasinglyaskingthequestion:“Doesitgetanybetterthanthis?”.BuysideexpectationsforWFEhavereachedextraordinarylevels(consensusnow~$170b+WFEin2027)andaretrackingwellaheadofguidancefromcompanies.ThisgrowthisunderpinnedbyahistoricoutlookforfabconstructioninthecomingyearsasnewDRAM/Foundryfabscomeonline(seeourdetailedfabtrackersforthesesegmentswithinournote).Forthisearningsseason,weseestrongfundamentalsforthegroupin1Qinto2Q,althoughtherealgrowthisn’texpectedtostartuntil2H26givenfabbuildouttiming.Wequestionhowmuchupsidetherecanbeinthenear-termgivenclean-roomconstraints,butbelievetheindustryisworkingtowardsacceleratingthesebuildplansasfastaspossible,stillleavingupsidepotential.Valuationsforthegroupnowstandanaverage+52%abovelong-termmediansonournumbers,creatinganadmittedlydifficultsetupintoearnings.Net-net,whilethebarishigh,webelievefundamentalmomentumwillremaininsemicaps’favorinthecomingquarters,helpingthesub-sectortocontinuetooutperformin2026.Ourfavoritenamesinthelarge-capgroupincludeBuy-ratedAMAT(forthosewhoaremorevaluationsensitive)andLRCX(forpositiveearningsrevisionpotential).InSMID-caps,wepreferBuy-ratedMKSI(high-betaWFE&backendexposure)andQ(balancedfront-andback-endmaterialsexposure).
RaisingWFEoutlooksfor2026and2027to+20%and+17%,respectively
WenowexpecttheWFEmarkettogrow+20%y/yin2026and+17%y/yin2027,upfromourpriorestimatesof+13%y/yand+14%y/y,respectively.OurrevisednumbersreflectafundamentallystrongerWFEenvironmentandstandclosertoupdatedcompanyWFEoutlooks(whichcallforWFEtogrow20%+in2026withfurthergrowthin2027).WesummarizeourkeythoughtsacrossthefourmajorWFEverticalsbelow:
nLeading-EdgeF/L:Ourupwardrevisionsinleading-edgeF/LprimarilystemfromourexpectationsofstructurallystrongerspendingatTSMC,whichmostrecentlyguidedits2026capitalexpendituresto$54b(atthemidpoint),implyingameaningful+30%y/ystep-upfrom2025levels.TSMCalsoindicateditexpectsitscapitalspendingtobe"significantlyhigher"overthenextthreeyearswiththeimplicationbeingthattotalCapExdollarsoverthenextthreeyears(DBe~$194b)wouldexceedthatofthepriorthree-yearperiod(~$101binexpendituresover2023-2025).Ourestimatesalsoassumeincrementalimprovementsintool-relatedspending
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Date
9April2026
IndustryUpdate
MelissaWeathers
ResearchAnalyst+1-212-250-2134
ApoorvaKumar
ResearchAssociate+1-212-250-9286
RossSeymore
ResearchAnalyst+1-415-617-3268
DeutscheBankSecuritiesInc.
IMPORTANTRESEARCHDISCLOSURESANDANALYSTCERTIFICATIONSLOCATEDINAPPENDIX1.DeutscheBankdoesandseekstodobusinesswithcompaniescoveredinitsresearchreports.Thus,investorsshouldbeawarethatthefirmmayhaveaconflictofinterestthatcouldaffecttheobjectivityofthisreport.Investorsshouldconsiderthisreportasonlyasinglefactorinmakingtheirinvestmentdecision.
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atINTCandSamsung(toolingspendingincreasingasamixofcapexatINTC;TaylorfabatSamsung).
nLagging-EdgeF/L:Onthelagging-edgefront,wearetakingalesscautiousstanceonspendingoutofChinaastheregionhasconsistentlydelivered~2
-3yearsofelevatedspending,despiteindustry-wideexpectationsofaslowdown.Ourhigher2026estimatesprimarilyreflectthisaswellasconstructivecommentaryoutofASMI(whichindicateditexpectsChinasalestoincreasein2026).Wealsoassumeamutedresumptionofspendingatthebroad-basedsemiconductorcompaniesfollowingrecentimprovementsincyclicalconditionsacrossbroad-basedend-markets.
nDRAM:Capexoutlooksfromthebigthreememoryvendorshavebeenparticularlybullishoverthelastthreemonths,withallthreecompaniesindicatinghighercapitalinvestmentsintheout-year.WebelievethisshouldbodewellforDRAMWFEandextendbeyond2026asvendorshavemulti-yearroadmapstobringonadditionalproductioncapacity.Thatsaid,weexpectspendinginthenear-termmaybelimitedbycleanroomconstraintsuntilmoreshellsarebuilt.
nNAND:OurNANDWFEestimatesaredrivenbyourexpectationsofstrongupgrade-relatedspendingin2026(LRCXnotedthat2026wouldbegrowthyearforNANDonitsF2Q26call).Wecurrentlymodelgrowthtocontinuein2027,againbroughtonbysteadyupgradespending.
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WFEOutlook
WenowexpecttheWFEmarkettogrow+20%y/yin2026and+17%y/yin2027,withgrowthbeingprimarilydrivenbyleading-edgeF/LandDRAMinvestments.
Withthisnote,weareupdatingourWFEforecaststoaccountforthevarietyofpositivedevelopmentssinceour
2026Outlook
atthestartoftheyear.Inshort,weareraisingour2026WFEestimatefrom$116b(+13%y/y)to$132b(+20%y/y),withournewestimatestandinglargelyin-linewithcompanyWFEoutlooks,reflectingourconstructivestanceonmemoryandleading-edgeF/Linvestmentsincreasingfurther.WeexpectaggregateWFEgrowthtoslightlydecelerateto+17%y/ygrowthin2027(albeitstillupversusourpriorestimateof+14%y/y)oncontinuedstrengthinmemoryandleading-edgeF/Linvestments.For2027,weexpectcontinuedgrowthoffthehigherbase,withmomentumcontinuinginDRAM,Leading-EdgeLogic,andNAND(thoughweseetepidgrowthinLagging-EdgeF/L).
Figure1:WFEMarketForecast
WFESPENDING
(in$m,unlessotherwisenoted)
2022
2023
2024
2025
2026E
2027E
Foundry/Logic
58,000
63,452
71,113
82,766
97,237
109,901
y/ychange
18%
9%
12%
16%
17%
13%
%ofTotalWFE
61%
71%
73%
75%
74%
71%
LeadingEdge
34,800
30,972
34,689
42,320
55,016
68,770
y/ychange
--
-11%
+12%
+22%
+30%
+25%
%ofTotalF/L
60%
49%
49%
51%
57%
63%
%ofTotalWFE
37%
34%
36%
38%
42%
45%
LaggingEdge
23,200
32,480
36,424
40,446
42,221
41,131
y/ychange
--
+40%
+12%
+11%
+4%
-3%
%ofTotalF/L
40%
51%
51%
49%
43%
37%
%ofTotalWFE
24%
36%
37%
37%
32%
27%
Memory
36,917
26,500
26,225
27,312
34,593
44,007
y/ychange
+3%
-28%
-1%
+4%
+27%
+27%
%ofTotalWFE
39%
29%
27%
25%
26%
29%
DRAM
16,917
18,500
19,225
17,978
23,160
30,298
y/ychange
-0%
+9%
+4%
-6%
+29%
+31%
%ofMemory
46%
70%
73%
66%
67%
69%
%ofTotalWFE
18%
21%
20%
16%
18%
20%
NAND
20,000
8,000
7,000
9,333
11,433
13,708
y/ychange
+5%
-60%
-13%
+33%
+23%
+20%
%ofMemory
54%
30%
27%
34%
33%
31%
%ofTotalWFE
21%
9%
7%
8%
9%
9%
TotalWFE
94,917
89,952
97,337
110,078
131,830
153,908
y/ychange
+12%
-5%
+8%
+13%
+20%
+17%
Source:DeutscheBankEstimates
Notes:WFE=WaferFabricationEquipment;DetailedWFEmarketmodelavailableuponrequest
CompanyOutlooksfor2026WFE:
LRCX
guiding+23%y/ygrowth;
Tokyo
Electron
guiding>15%y/ygrowth;
AMAT
guidingitsSemiSystemssegmenttogrow>20%y/ygrowth
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Leading-EdgeF/L:ExpectingrobustgrowthatTSMCwithincrementalimprovementsatINTC/Samsung
Wenowmodelleading-edgeWFEspendinggrowthtobe+30%y/yin2026and+25%y/yin2027,upfromourpriorestimatesof+22%y/yin2026and+15%in2027.OurupwardrevisionsareprimarilyafunctionofstructurallystrongerspendingatTSMC,whichmostrecentlyguidedits2026capitalexpendituresto$54b(atthemidpoint),implyingameaningful+30%y/ystep-upfrom2025levels.Overthelonger-term,TSMCindicateditexpectsitscapitalspendingtobe"significantlyhigher"overthenextthreeyearswiththeimplicationbeingthattotalCapExdollarsoverthenextthreeyears(DBe~$194b)wouldexceedthatofthepriorthreeyearperiod(~$101binexpendituresover2023-2025).Ourhigherleading-edgeF/Lgrowthestimatesalsoassumesincrementalimprovementsintool-relatedspendingatINTCandSamsung(TaylorfabscheduledtocommenceproductionbyEOY26+recent
localapprovals
pavingthewayforasecondplannedfabatTaylor).Forcontext,recallthatINTCindicatedthatthemixofitscapexspendingnextyearwouldskewmoreheavilytowardstooling(despiteaggregatecapexbeingflattodownontheyear).It'salsoworthmentioningthatINTChasrecentlyengagedinafewdealsthatsuggestconfidenceinthecompany'soutlookforfoundry(e.g.,
repurchasingApollo'sstakeintheIrelandJVfab
andjoiningElonMusk'sterafabproject).
Onaseparatebutrelatednote,wehavemappedoutallofTSMC'supcomingfront-andback-endfabricationfacilities,alongwiththecompany'sexistingfabs,tohelpinvestorspreciselyidentifythedriversoftheinflectioninTSMC'scapitalspendingplans.RefertothesubsequentDBFabTrackerportionofthisnotefordetails.
Figure2:YTDRevisionstoConsensusCY26CapExatTSMC/INTC/Samsung
YTDRevision(%)
TSMCIntelSamsung
20%
15%
+14%
10%
+7%
5%
+2%
0%
-5%
Source:DeutscheBankResearch,BloombergFinanceLP
Note:NotethatSamsungestimatesinthefigureaboveincludeF/Landmemorycapitalexpenditures
FormorecoloronTSMC,pleaserefertoourcoveringEuropeanTechnology
HardwareAnalyst,
RobSanders
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9April2026
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Lagging-EdgeF/L:PotentialforChinatoupsideagainin2026,withdigestionin2027
Onthelagging-edgefront,wenowmodelWFEspendingtogrow+4%y/yin2026,upfromourpriorforecastofa-3%y/ycontraction.TheupwardrevisioninourforecastsprimarilystemsfromalesscautiousstanceonspendingoutofChina(~70%oflagging-edgespendasperourestimates),wherewenowmodellagging-edgespendinggrowthof+5%y/yin2026andamoderationof-5%y/ythefollowingyearin2027(notethatourlagging-edgeestimatesfor2027remainlargelyunchanged).Thatbeingsaid,weflagthatthetimingandmagnitudeofadigestioninChinaremainsahighlycontestedandhighlyunpredictabletrendwithintheWFEmarket.Theregionhasconsistentlydelivered~2-3yearsofelevatedspending,despiteindustry-wideexpectationsofaslowdown.Ourhigher2026estimatesprimarilyreflecttheregion'stendencytosurprisetotheupsideaswellasconstructivecommentaryoutofASMI(whichindicateditexpectsChinasalestoincreasein2026).Ourmodelalsoassumesamutedresumptionofspendingbythebroad-basedsemiconductorcompaniesfollowingrecentimprovementsincyclicalconditionsacrossbroad-basedend-markets(seeourmostrecent
End-Market
Monitor
fordetails),whichnotablyalignswithrecentcommentaryatcompanieslikeASMI,whichguidedforamodestsalesimprovementintheirpowerandanalogsegmentsfor2026.
Figure3:CapitalSpendingatTopBroad-Based/AnalogCompanies
CapEx($m)
TexasInstrumentsInfineonSTMicroelectronicsAnalogDevicesONSemiNXP
18,000
16,223
15,000
12,704
12,000
11,559
9,717
8,931
9,181
9,000
7,614
6,000
5,222
4,605
3,949
3,000
0
2027
201820192020202120222023202420252026
Source:DeutscheBankResearch,BloombergFinanceLP
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DRAM:Expectingtightdemand-supplyconditionstodriveadditionalWFEspending
ConditionsintheDRAMmarkethaveremainedcontinuallytightoverthelast3months,withcompanycommentarysuggestingthatdemandwillcontinuetofaroutpacesupplyfortheforeseeablefuture.Thishaspromptedmanyofthememoryvendorstoguideforhighercapitalspendingin2026/2027astheyexpandcapacitytomeetstructurallyhigherdemandlevels.Webrieflysummarizecapitalspendingexpectationsbelow:
nMicron:MUindicatedthatFY26CapExwouldbe>$25bonitsmostrecentcallwithamajorityoftheincreasebeingtiedtocleanroomfacility-relatedinvestments.ThecompanyexpectsspendingtofurtherincreaseinFY27(tothetuneof>$10by/y).Weaccountforthesechangesinour
MUmodel,
butnotethatonacalendaryearbasis,weseeCapExgrowing+57%y/yin2026and+27%y/yin2027.
nSamsungElectronics:AlthoughSamsungdidnotoutlineaspecificCapExnumberonitslastearningscall,itdidnotethatitexpectsa"meaningful"increaseinitsmemoryCapExfor2026.WhileitisdifficulttoparseoutthemixofSamsung'sinvestments,wehighlightthatconsensusexpectationscurrentlyforecasttotalcompanyCapExtorise+30%y/yin2026and+10%in2027.
nSKHynix:MuchlikeSamsung,SKHynixalsodidnotprovideaspecificCapExnumberinitsmostrecentoutlook.However,thecompanyofferedthesamegeneralmessageasitspeers,citingthatits2026CapExisexpectedtosignificantlyincreasey/yduetocapacityexpansionsandinvestmentsinfutureinfrastructure.ThisseemstobefactoredintoStreetnumbersascurrentconsensusexpectationsforecast+44%y/yCapExgrowthin2026and+16%y/yCapExgrowthin2027
Allin,wethinkhighercapitalinvestmentsatthemajormemoryco'sshouldbodewellforDRAMWFEin2026and2027.Additionally,basedonourDRAMdemand-supplymath,webelievetightnessinmemorymarketscouldpersistthrough2027andinto2028astheindustrymovestowardsproductslikeHBM4/HBM4e,whichcarryhighertraderatios(refertoouroriginal
DRAMD-Snote
forourthoughtprocess).Weexpectthistosubsequentlydriveacceleratedconstruction/expansionofseveralfabsglobally(similartohowthe2025tightnessacceleratedtheconstructionofcertainKoreanfabsthisyear).Assuch,weareraisingour2026DRAMWFEforecastsfrom+22%y/yto+29%y/y,withaslightaccelerationto+31%y/yin2027(drivenbythetimingofupcomingfabramps;e.g.,ID1/TongluofabatMicron,M15X/YonginatSKHynix,P4expansionatSamsung,etc.).
*ContinuetothenextpageforasummarizedversionofourDRAMD-Smodel(fullmodelavailableuponrequest).
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Figure4:DRAMDemand-SupplyForecast(Summarized)
ForecastingRequiredDRAMWSPMNeededtoSupportDRAMBitGrowth
Forecast
20232024202520262027202820292030
25-30Growth
+201k
+2%
+537k
+20%
+7%
+11%
+1,285k
+25k+120k
+120k
+50k
+10k
+50k
+45k
+0k
+110k
+200k+55k+200k
+100k
+200k+0k+0k+0k
StandardDRAMWSPMRequirements('000s)
1,356
1,490
1,563
1,669
1,765
1,838
1,804
1,764
y/yStandardDRAMBitDemandGrowth(%)
+10%
+5%
+20%
+19%
+15%
+9%
+9%
(+)UpliftduetoHigherHBMTradeRatio
N/A
(-)ImpactfromBit/WaferEfficiencies
-8%
-8%
-6%
-6%
-6%
(-)ImpactfromYieldImprovements
-5%
-5%
-5%
-5%
-5%
=Assumedy/yStandardDRAMWSPMGrowth(%)
+7%
+6%
+4%
-2%
-2%
asa%ofTotalDRAMWSPM
95%
85%
82%
78%
71%
62%
65%
67%
HBMWSPMRequirements('000s)
70
270
350
479
716
1,117
993
887
y/yHBMBitDemandGrowth(%)
+286%
+30%
+45%
+55%
+67%
-0%
+0%
(+)UpliftduetoHigherHBMTradeRatio
+5%
+8%
+3%
+3%
+3%
(-)ImpactfromBit/WaferEfficiencies
-8%
-8%
-6%
-6%
-6%
(-)ImpactfromYieldImprovements
-5%
-5%
-8%
-8%
-8%
=Assumedy/yHBMWSPMGrowth(%)
+37%
+49%
+56%
-11%
-11%
asa%ofTotalDRAMWSPM
5%
15%
18%
22%
29%
38%
35%
33%
TotalDRAMWSPMRequirements('000s)
1,426
1,760
1,913
2,149
2,480
2,955
2,797
2,651
EstimatedDRAMWSPMCapacity('000s)
1,913
2,028
2,288
2,556
2,893
3,198
Surplus/(Shortfall)
-121k
-192k
-399k
+96k
+547k
Demand/Supply(%)
106%
108%
116%
97%
83%
(1)TraditionalDRAMscaleslinearly;Intheory,1additionalwaferstartstranslatesto1additionalunitofnon-HBMDRAM
(2)DRAMcellshrinkageshouldyieldhigherbitdensity/waferovertime,especiallywithmajornodetransitions(1ナт1ニ)
(3)Improvedmanufacturingprocessesshouldyieldconsistentimprovementsforlesscomplexnon-HBMDRAM
(4)Growthinthetraderatio(from3:1т4:1andbeyond)impliesthatitwilltakemorewaferstoproduceanincrementalbitofHBM
(5)Advancesinfabricationshouldyieldhigherbitdensity/waferovertime,especiallywithmajornodetransitions(1ナт1ニ)
(6)ImprovementsinHBMmanufacturingshouldgraduallyimproveovertime,loweringtherateofgrowthrequiredinHBMWSPMs
(7)WebelieveHBMshouldaccountforagreaterportionoftotalDRAMWSPMovertheLT,drivenbygrowthintheHBMtrade
ratioandstructurallyhigherAI-relateddemand;Ourmodelestimatesthat~30%oftotalDRAMcapacitywillbeallocatedtowards
HBMoverthelong-term
IncrementalDRAMWSPMCapacity('000s):+115k+260k+268k+338k+305k
Big3MemoryVendors:
MicronHiroshimaExpansion
+13k+13k
MicronID1
+80k+40k
MicronID2
+20k+70k+30k
MicronNYFabComplex(Fab1)
+50k
MicronManassasExpansion(Fab6)
+10k
MicronPSMCFab
+20k+30k
MicronPSMCFab2(Expansion)
SamsungHwaseongConversion
+15k+30k
SamsungPyeongtaek(P4Expansion)
+70k+40k
SamsungPyeongtaek(P5)
+50k+75k+75k
SKHynixM15X
+35k+20k
SKHynixYonginFab1
+50k+50k+50k+50k
SKHynixYonginFab2
SKHynixIcheon(M16)
+50k+50k
ChineseVendors:
CXMTShanghaiFabExpansion
CXMTHefei(FabA1)
CXMTHefei(FabA2)
+50k+50k+50k+50k
CXMTBeijing(FabC1+C2)JHICCJinjiang
Locatedw/inMicron'scurrentHiroshimasite;ConstructiontobedoneEOY27,withshipmentsin~2028;DBe~25kWSPMID1HVMtostartin2027;DBeplannedcapacity~120kWSPM
ID2constructiontostartin2026,withoperationsbyEOY28;DBeplannedcapacity~120kWSPM4-FabComplex;Fab1tostartHVMin2030
MUindicateditwasmakinginvestmentstomodernizeandexpandthisfab;DBeexpansiontobe~10kWSPM
AcquiredfromPSMCin2026;MUPRindicatesfacilityhas~300ksq.ftofcleanroomspaceandnooutputuntil2H27;DBe50kWSPM(halfofoneofMU'sNYfabs)
~270ksq.ft.ofcleanroomspace(similarinsizetothefirstfab);ShipmentsstartinFY28andconstructionstartsEOYFY26(DBeexpects1-2yrbuildwithproductioninCY28)
Samsungreportedlyconvertinglegacyproductionlinesto1CDRAMbyEOY2025
RecentChosunDailyarticle(Feb-26)indicatedthattotalcapacitywouldbe100-120kWSPM(DBe~110kWSPM)
P5beginsHVMin2028;ReportedlyalargerfabwithmorecleanroomspacethanP4(DBe~200ktotalcapacity)
Constructioncompletein4Q25;SKwillrampin2026;Reportedlywilladd35kWSPM,withpotentialtofurtherexpandto55-60kPlannedcapacityof200k;FirstcleanroomtostartHVMin1Q27;Weexpectgradualrampupby2030
Plannedcapacityof200k;Noconstructionplanasofyet,butDBeassumespotentialrampstartingin2029
SKreportedlyexpandedproduction~190kin~2H25;FacilityoriginallystartedHVMin1Q21withplannedcapacityof~130k
Plannedcapacityisreportedly2-3xthatofHefeiFabs,whichhadcapacitiesof~100-150kindividuallybyEOY25;HVMin2027DBecapacitywas~100kbyEOY25
DBecapacitywas~100kbyEOY25
DBeAggregatecapacityof~100kWSPM
Plannedcapacityof~15k;HVMstartedin~2022post-EntityListdisruptions
Source:Gartner,DeutscheBankResearch
Note:Notethatthethetableaboveisabbreviated;Fullmodelavailableuponrequest
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%ofTotalWFESpend
61%39%
29%
27%
71%
73%
Figure6:WFESpendingMix(2022-2026E)
Foundry/LogicMemory
100%
75%
50%
25%
0%
Source:DeutscheBankResearch,CompanyData
%ofFoundryCapEx
59%
Figure8:WFEasa%ofFoundry/IDMCapEx
WFEasa%ofCapEx5-yrAvg.
75%
56%55%
50%
25%
0%
Source:DeutscheBankResearch,SemiconductorIndustryAssociation,BloombergFinanceLP
NAND:Expectinggrowthin2026,withmoderationin2027
25%
26%
75%
74%
60%
56%
Aswe'veseenthroughout2025,thesurgeindemandforHBMhassignificantlyrestrictedthenumberofwafersandcapacityavailableforothertypesofmemory.ThishasledtoaseveretighteninginNANDsupply,especiallyforproductslikeeSSDs,whichhavebeeninhighdemandgiventheirapplicationsindatacenters.Ontopofthis,weseepositiveread-throughsfromcompanieslikeLRCX,whocontinuetoexpectstrongupgrade-relatedspendingtocontinueinto2026(LRCXnotedthat2026wouldbegrowthyearforNANDonitsF2Q26call).Thatsaid,wecontinuetohaveaconstructiveoutlookonNANDWFEandareraisingour2026NANDWFEgrowthforecastfrom+19%y/yto+23%y/y.Weexpectthisgrowthtomoderateto+19%y/yin2027(unchanged),aslightdecelerationingrowthbutstillsolid.
Figure5:WFESpendingbyVertical(2022-2026E)
WFESpending($b)
LeadingF/LLaggingF/LDRAMNAND
132
150
110
9
11
97
7
19
95
23
90
8
19
32
31
100
18
20
42
40
17
36
50
23
55
42
35
35
0
Source:DeutscheBankResearch,CompanyData
Figure7:WFEasa%ofSemiRevs
%ofIndustrySales
WFEasa%ofSemiRevs5-yrAvg.
20%
17%
17%
15%
14%
13%
15%
10%
5%
0%
Source:DeutscheBankResearch,SemiconductorIndustryAssociation,BloombergFinanceLP
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DBFabTracker
TohelpinvestorspreciselyidentifythedriversbehindTSMC'scapitalspendingplans,we'vemappedoutallofthecompany'supcomingfront-endfabricationfacilities,alongwiththecompany'sexistingfabs.Refertothechartbelowforincrementaldetails.
Figure9:OverviewofTSMC'sFabs
Fab10(Shanghai)
-Production
-110-350nm
-Est.~100kWSPM
Fab16(Nanjing)
-Production
-12-16nm,22-28nm
-Est.~40kWSPM
Fab11(Washington)
-Production
-180-350nm
-Est.~39kWSPM
-3-5nm
-Currently~20-24kWPSM(aggregateest.capacity>100kWSPM)
Fab18(Tainan)
-Production
-3nm,4-5nm
-Est.~275kWSPM
Production
JapanFabsI+II(Kumamoto):
-Expansion
-12-40nm(FabI);3nm(FabII)
-Fab1(est.~50kWSPM);FabIIstarting2028(aggregatecapacityest.>100kWSPM)
Fab2A+B(Hsinchu)
-Production
-450nm
-Est.~86kWSPM
Fab24(Dresden):
-Underconstruction
-12-16nm,22-28nm
-Installationsin2H26;HVMin2027(est.~40kWSPM)
Fab3+4(Hsinchu)
-Production
-180-350nm
-Est.~108kWSPM
Fab5(Hsinchu)
-Production
-110-180nm
-Est.~36kWSPM
Fab8(Hsinchu)
-Production
-110-250nm
-Est.~79kWSPM
Fab20(Hsinchu):
-Expansion/ramping
-<2nmnodes
-20-25kWSPMcurrently(est.~120kWSPMbyYE26)
Fab12(Hsinchu)
-Production
-3nm
-Est.~150kWSPM
TataFab(Gujurat):
-Underconstruction
-28nmnodes
-Expectedtobeoperationalbylate2026(est.~50kWSPM)
Fab6(Tainan)
-Production
-110-180nm
-Est.~152kWSPM
SSMCJVFab(Singapore)
-Production;TSMC~38.8%share
-180-250nm
-Est.~68kWSPM
Expansion
Construction
-Permitting/underconstruction;
-2nmnodes
-HVMexpectedin2H28;(est.~50kWSPMatP1)
Source:DeutscheBankResearch,CompanyFiling,PressReleases
Notes:Ourfabdatabaseisnotexhaustiveandmayomitlesser-knownfabricationfacilities;OurdatasetisintendedtoprovideinvestorswithacomprehensiveoverviewofthemanufacturingbaseformajorIDMsandFoundries;Dataisupdatedonamonthlybasis
【价值目录】网整理:
Page10DeutscheBankSecuritiesInc.
9April2026
SemicapEquipment
USSemicapEquipment
Foundry/IDMCapEx
Weregularlymonitorspendingtrendsacrossasetof30+semiconductormanufacturersasWFEtypicallyaccountsfor~50-60%ofannualfoundry/IDMCapEx.Basedonthemostrecentdata,foundry/IDMcapitalexpendituresareexpectedtorise+27%y/yin2026and+12%y/yin2027.Theseestimatesaredirectionallyin-linewithourWFEgrowthforecasts(+20%y/yin2026and+17%in2027),butdifferentonanabsolutebasis,thoughnotethatthedeltalikelystemsfromdifferencesinthemixofinvestments(i.e.,isspendinggearedtowardsphysicalinfrastructureorcleanroomtooling?).
Figure10:Foundry/IDMCapEx
CAPITALEXPENDITURES
(in$m,unlessotherwisenoted)
A
2018
A
2019
A
2020
A
2021
A
2022
A
2023
A
2024
A
2025
E
2026
E
2027
TSMC
10,474
14,904
17,387
30,089
36,339
30,476
29,762
40,940
54,188
65,026
SamsungElectronics
26,872
21,776
31,918
41,174
38,368
44,115
37,701
33,446
43,411
47,844
Intel
15
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