德银-美国半导体设备行业更新:2026年一季报展望境况还能更好吗?-1Q26 Preview:Does it get any better than this-20260409_第1页
德银-美国半导体设备行业更新:2026年一季报展望境况还能更好吗?-1Q26 Preview:Does it get any better than this-20260409_第2页
德银-美国半导体设备行业更新:2026年一季报展望境况还能更好吗?-1Q26 Preview:Does it get any better than this-20260409_第3页
德银-美国半导体设备行业更新:2026年一季报展望境况还能更好吗?-1Q26 Preview:Does it get any better than this-20260409_第4页
德银-美国半导体设备行业更新:2026年一季报展望境况还能更好吗?-1Q26 Preview:Does it get any better than this-20260409_第5页
已阅读5页,还剩35页未读 继续免费阅读

下载本文档

版权说明:本文档由用户提供并上传,收益归属内容提供方,若内容存在侵权,请进行举报或认领

文档简介

DeutscheBankResearch

NorthAmerica

UnitedStates

TMT

SemicapEquipment

Industry

USSemicapEquipment

1Q26Preview:Doesitgetanybetterthanthis?

WithSemicapsharesalreadyup~50%YTDthisyear,investorsarenowincreasinglyaskingthequestion:“Doesitgetanybetterthanthis?”.BuysideexpectationsforWFEhavereachedextraordinarylevels(consensusnow~$170b+WFEin2027)andaretrackingwellaheadofguidancefromcompanies.ThisgrowthisunderpinnedbyahistoricoutlookforfabconstructioninthecomingyearsasnewDRAM/Foundryfabscomeonline(seeourdetailedfabtrackersforthesesegmentswithinournote).Forthisearningsseason,weseestrongfundamentalsforthegroupin1Qinto2Q,althoughtherealgrowthisn’texpectedtostartuntil2H26givenfabbuildouttiming.Wequestionhowmuchupsidetherecanbeinthenear-termgivenclean-roomconstraints,butbelievetheindustryisworkingtowardsacceleratingthesebuildplansasfastaspossible,stillleavingupsidepotential.Valuationsforthegroupnowstandanaverage+52%abovelong-termmediansonournumbers,creatinganadmittedlydifficultsetupintoearnings.Net-net,whilethebarishigh,webelievefundamentalmomentumwillremaininsemicaps’favorinthecomingquarters,helpingthesub-sectortocontinuetooutperformin2026.Ourfavoritenamesinthelarge-capgroupincludeBuy-ratedAMAT(forthosewhoaremorevaluationsensitive)andLRCX(forpositiveearningsrevisionpotential).InSMID-caps,wepreferBuy-ratedMKSI(high-betaWFE&backendexposure)andQ(balancedfront-andback-endmaterialsexposure).

RaisingWFEoutlooksfor2026and2027to+20%and+17%,respectively

WenowexpecttheWFEmarkettogrow+20%y/yin2026and+17%y/yin2027,upfromourpriorestimatesof+13%y/yand+14%y/y,respectively.OurrevisednumbersreflectafundamentallystrongerWFEenvironmentandstandclosertoupdatedcompanyWFEoutlooks(whichcallforWFEtogrow20%+in2026withfurthergrowthin2027).WesummarizeourkeythoughtsacrossthefourmajorWFEverticalsbelow:

nLeading-EdgeF/L:Ourupwardrevisionsinleading-edgeF/LprimarilystemfromourexpectationsofstructurallystrongerspendingatTSMC,whichmostrecentlyguidedits2026capitalexpendituresto$54b(atthemidpoint),implyingameaningful+30%y/ystep-upfrom2025levels.TSMCalsoindicateditexpectsitscapitalspendingtobe"significantlyhigher"overthenextthreeyearswiththeimplicationbeingthattotalCapExdollarsoverthenextthreeyears(DBe~$194b)wouldexceedthatofthepriorthree-yearperiod(~$101binexpendituresover2023-2025).Ourestimatesalsoassumeincrementalimprovementsintool-relatedspending

【价值目录】网整理:

Date

9April2026

IndustryUpdate

MelissaWeathers

ResearchAnalyst+1-212-250-2134

ApoorvaKumar

ResearchAssociate+1-212-250-9286

RossSeymore

ResearchAnalyst+1-415-617-3268

DeutscheBankSecuritiesInc.

IMPORTANTRESEARCHDISCLOSURESANDANALYSTCERTIFICATIONSLOCATEDINAPPENDIX1.DeutscheBankdoesandseekstodobusinesswithcompaniescoveredinitsresearchreports.Thus,investorsshouldbeawarethatthefirmmayhaveaconflictofinterestthatcouldaffecttheobjectivityofthisreport.Investorsshouldconsiderthisreportasonlyasinglefactorinmakingtheirinvestmentdecision.

【价值目录】网整理:

9April2026

SemicapEquipment

USSemicapEquipment

atINTCandSamsung(toolingspendingincreasingasamixofcapexatINTC;TaylorfabatSamsung).

nLagging-EdgeF/L:Onthelagging-edgefront,wearetakingalesscautiousstanceonspendingoutofChinaastheregionhasconsistentlydelivered~2

-3yearsofelevatedspending,despiteindustry-wideexpectationsofaslowdown.Ourhigher2026estimatesprimarilyreflectthisaswellasconstructivecommentaryoutofASMI(whichindicateditexpectsChinasalestoincreasein2026).Wealsoassumeamutedresumptionofspendingatthebroad-basedsemiconductorcompaniesfollowingrecentimprovementsincyclicalconditionsacrossbroad-basedend-markets.

nDRAM:Capexoutlooksfromthebigthreememoryvendorshavebeenparticularlybullishoverthelastthreemonths,withallthreecompaniesindicatinghighercapitalinvestmentsintheout-year.WebelievethisshouldbodewellforDRAMWFEandextendbeyond2026asvendorshavemulti-yearroadmapstobringonadditionalproductioncapacity.Thatsaid,weexpectspendinginthenear-termmaybelimitedbycleanroomconstraintsuntilmoreshellsarebuilt.

nNAND:OurNANDWFEestimatesaredrivenbyourexpectationsofstrongupgrade-relatedspendingin2026(LRCXnotedthat2026wouldbegrowthyearforNANDonitsF2Q26call).Wecurrentlymodelgrowthtocontinuein2027,againbroughtonbysteadyupgradespending.

Page2DeutscheBankSecuritiesInc.

【价值目录】网整理:

DeutscheBankSecuritiesInc.Page3

9April2026

SemicapEquipment

USSemicapEquipment

WFEOutlook

WenowexpecttheWFEmarkettogrow+20%y/yin2026and+17%y/yin2027,withgrowthbeingprimarilydrivenbyleading-edgeF/LandDRAMinvestments.

Withthisnote,weareupdatingourWFEforecaststoaccountforthevarietyofpositivedevelopmentssinceour

2026Outlook

atthestartoftheyear.Inshort,weareraisingour2026WFEestimatefrom$116b(+13%y/y)to$132b(+20%y/y),withournewestimatestandinglargelyin-linewithcompanyWFEoutlooks,reflectingourconstructivestanceonmemoryandleading-edgeF/Linvestmentsincreasingfurther.WeexpectaggregateWFEgrowthtoslightlydecelerateto+17%y/ygrowthin2027(albeitstillupversusourpriorestimateof+14%y/y)oncontinuedstrengthinmemoryandleading-edgeF/Linvestments.For2027,weexpectcontinuedgrowthoffthehigherbase,withmomentumcontinuinginDRAM,Leading-EdgeLogic,andNAND(thoughweseetepidgrowthinLagging-EdgeF/L).

Figure1:WFEMarketForecast

WFESPENDING

(in$m,unlessotherwisenoted)

2022

2023

2024

2025

2026E

2027E

Foundry/Logic

58,000

63,452

71,113

82,766

97,237

109,901

y/ychange

18%

9%

12%

16%

17%

13%

%ofTotalWFE

61%

71%

73%

75%

74%

71%

LeadingEdge

34,800

30,972

34,689

42,320

55,016

68,770

y/ychange

--

-11%

+12%

+22%

+30%

+25%

%ofTotalF/L

60%

49%

49%

51%

57%

63%

%ofTotalWFE

37%

34%

36%

38%

42%

45%

LaggingEdge

23,200

32,480

36,424

40,446

42,221

41,131

y/ychange

--

+40%

+12%

+11%

+4%

-3%

%ofTotalF/L

40%

51%

51%

49%

43%

37%

%ofTotalWFE

24%

36%

37%

37%

32%

27%

Memory

36,917

26,500

26,225

27,312

34,593

44,007

y/ychange

+3%

-28%

-1%

+4%

+27%

+27%

%ofTotalWFE

39%

29%

27%

25%

26%

29%

DRAM

16,917

18,500

19,225

17,978

23,160

30,298

y/ychange

-0%

+9%

+4%

-6%

+29%

+31%

%ofMemory

46%

70%

73%

66%

67%

69%

%ofTotalWFE

18%

21%

20%

16%

18%

20%

NAND

20,000

8,000

7,000

9,333

11,433

13,708

y/ychange

+5%

-60%

-13%

+33%

+23%

+20%

%ofMemory

54%

30%

27%

34%

33%

31%

%ofTotalWFE

21%

9%

7%

8%

9%

9%

TotalWFE

94,917

89,952

97,337

110,078

131,830

153,908

y/ychange

+12%

-5%

+8%

+13%

+20%

+17%

Source:DeutscheBankEstimates

Notes:WFE=WaferFabricationEquipment;DetailedWFEmarketmodelavailableuponrequest

CompanyOutlooksfor2026WFE:

LRCX

guiding+23%y/ygrowth;

Tokyo

Electron

guiding>15%y/ygrowth;

AMAT

guidingitsSemiSystemssegmenttogrow>20%y/ygrowth

【价值目录】网整理:

Page4DeutscheBankSecuritiesInc.

9April2026

SemicapEquipment

USSemicapEquipment

Leading-EdgeF/L:ExpectingrobustgrowthatTSMCwithincrementalimprovementsatINTC/Samsung

Wenowmodelleading-edgeWFEspendinggrowthtobe+30%y/yin2026and+25%y/yin2027,upfromourpriorestimatesof+22%y/yin2026and+15%in2027.OurupwardrevisionsareprimarilyafunctionofstructurallystrongerspendingatTSMC,whichmostrecentlyguidedits2026capitalexpendituresto$54b(atthemidpoint),implyingameaningful+30%y/ystep-upfrom2025levels.Overthelonger-term,TSMCindicateditexpectsitscapitalspendingtobe"significantlyhigher"overthenextthreeyearswiththeimplicationbeingthattotalCapExdollarsoverthenextthreeyears(DBe~$194b)wouldexceedthatofthepriorthreeyearperiod(~$101binexpendituresover2023-2025).Ourhigherleading-edgeF/Lgrowthestimatesalsoassumesincrementalimprovementsintool-relatedspendingatINTCandSamsung(TaylorfabscheduledtocommenceproductionbyEOY26+recent

localapprovals

pavingthewayforasecondplannedfabatTaylor).Forcontext,recallthatINTCindicatedthatthemixofitscapexspendingnextyearwouldskewmoreheavilytowardstooling(despiteaggregatecapexbeingflattodownontheyear).It'salsoworthmentioningthatINTChasrecentlyengagedinafewdealsthatsuggestconfidenceinthecompany'soutlookforfoundry(e.g.,

repurchasingApollo'sstakeintheIrelandJVfab

andjoiningElonMusk'sterafabproject).

Onaseparatebutrelatednote,wehavemappedoutallofTSMC'supcomingfront-andback-endfabricationfacilities,alongwiththecompany'sexistingfabs,tohelpinvestorspreciselyidentifythedriversoftheinflectioninTSMC'scapitalspendingplans.RefertothesubsequentDBFabTrackerportionofthisnotefordetails.

Figure2:YTDRevisionstoConsensusCY26CapExatTSMC/INTC/Samsung

YTDRevision(%)

TSMCIntelSamsung

20%

15%

+14%

10%

+7%

5%

+2%

0%

-5%

Source:DeutscheBankResearch,BloombergFinanceLP

Note:NotethatSamsungestimatesinthefigureaboveincludeF/Landmemorycapitalexpenditures

FormorecoloronTSMC,pleaserefertoourcoveringEuropeanTechnology

HardwareAnalyst,

RobSanders

DeutscheBankSecuritiesInc.Page5

9April2026

SemicapEquipment

USSemicapEquipment

Lagging-EdgeF/L:PotentialforChinatoupsideagainin2026,withdigestionin2027

Onthelagging-edgefront,wenowmodelWFEspendingtogrow+4%y/yin2026,upfromourpriorforecastofa-3%y/ycontraction.TheupwardrevisioninourforecastsprimarilystemsfromalesscautiousstanceonspendingoutofChina(~70%oflagging-edgespendasperourestimates),wherewenowmodellagging-edgespendinggrowthof+5%y/yin2026andamoderationof-5%y/ythefollowingyearin2027(notethatourlagging-edgeestimatesfor2027remainlargelyunchanged).Thatbeingsaid,weflagthatthetimingandmagnitudeofadigestioninChinaremainsahighlycontestedandhighlyunpredictabletrendwithintheWFEmarket.Theregionhasconsistentlydelivered~2-3yearsofelevatedspending,despiteindustry-wideexpectationsofaslowdown.Ourhigher2026estimatesprimarilyreflecttheregion'stendencytosurprisetotheupsideaswellasconstructivecommentaryoutofASMI(whichindicateditexpectsChinasalestoincreasein2026).Ourmodelalsoassumesamutedresumptionofspendingbythebroad-basedsemiconductorcompaniesfollowingrecentimprovementsincyclicalconditionsacrossbroad-basedend-markets(seeourmostrecent

End-Market

Monitor

fordetails),whichnotablyalignswithrecentcommentaryatcompanieslikeASMI,whichguidedforamodestsalesimprovementintheirpowerandanalogsegmentsfor2026.

Figure3:CapitalSpendingatTopBroad-Based/AnalogCompanies

CapEx($m)

TexasInstrumentsInfineonSTMicroelectronicsAnalogDevicesONSemiNXP

18,000

16,223

15,000

12,704

12,000

11,559

9,717

8,931

9,181

9,000

7,614

6,000

5,222

4,605

3,949

3,000

0

2027

201820192020202120222023202420252026

Source:DeutscheBankResearch,BloombergFinanceLP

【价值目录】网整理:

Page6DeutscheBankSecuritiesInc.

9April2026

SemicapEquipment

USSemicapEquipment

DRAM:Expectingtightdemand-supplyconditionstodriveadditionalWFEspending

ConditionsintheDRAMmarkethaveremainedcontinuallytightoverthelast3months,withcompanycommentarysuggestingthatdemandwillcontinuetofaroutpacesupplyfortheforeseeablefuture.Thishaspromptedmanyofthememoryvendorstoguideforhighercapitalspendingin2026/2027astheyexpandcapacitytomeetstructurallyhigherdemandlevels.Webrieflysummarizecapitalspendingexpectationsbelow:

nMicron:MUindicatedthatFY26CapExwouldbe>$25bonitsmostrecentcallwithamajorityoftheincreasebeingtiedtocleanroomfacility-relatedinvestments.ThecompanyexpectsspendingtofurtherincreaseinFY27(tothetuneof>$10by/y).Weaccountforthesechangesinour

MUmodel,

butnotethatonacalendaryearbasis,weseeCapExgrowing+57%y/yin2026and+27%y/yin2027.

nSamsungElectronics:AlthoughSamsungdidnotoutlineaspecificCapExnumberonitslastearningscall,itdidnotethatitexpectsa"meaningful"increaseinitsmemoryCapExfor2026.WhileitisdifficulttoparseoutthemixofSamsung'sinvestments,wehighlightthatconsensusexpectationscurrentlyforecasttotalcompanyCapExtorise+30%y/yin2026and+10%in2027.

nSKHynix:MuchlikeSamsung,SKHynixalsodidnotprovideaspecificCapExnumberinitsmostrecentoutlook.However,thecompanyofferedthesamegeneralmessageasitspeers,citingthatits2026CapExisexpectedtosignificantlyincreasey/yduetocapacityexpansionsandinvestmentsinfutureinfrastructure.ThisseemstobefactoredintoStreetnumbersascurrentconsensusexpectationsforecast+44%y/yCapExgrowthin2026and+16%y/yCapExgrowthin2027

Allin,wethinkhighercapitalinvestmentsatthemajormemoryco'sshouldbodewellforDRAMWFEin2026and2027.Additionally,basedonourDRAMdemand-supplymath,webelievetightnessinmemorymarketscouldpersistthrough2027andinto2028astheindustrymovestowardsproductslikeHBM4/HBM4e,whichcarryhighertraderatios(refertoouroriginal

DRAMD-Snote

forourthoughtprocess).Weexpectthistosubsequentlydriveacceleratedconstruction/expansionofseveralfabsglobally(similartohowthe2025tightnessacceleratedtheconstructionofcertainKoreanfabsthisyear).Assuch,weareraisingour2026DRAMWFEforecastsfrom+22%y/yto+29%y/y,withaslightaccelerationto+31%y/yin2027(drivenbythetimingofupcomingfabramps;e.g.,ID1/TongluofabatMicron,M15X/YonginatSKHynix,P4expansionatSamsung,etc.).

*ContinuetothenextpageforasummarizedversionofourDRAMD-Smodel(fullmodelavailableuponrequest).

【价值目录】网整理:

DeutscheBankSecuritiesInc.Page7

9April2026

SemicapEquipment

USSemicapEquipment

Figure4:DRAMDemand-SupplyForecast(Summarized)

ForecastingRequiredDRAMWSPMNeededtoSupportDRAMBitGrowth

Forecast

20232024202520262027202820292030

25-30Growth

+201k

+2%

+537k

+20%

+7%

+11%

+1,285k

+25k+120k

+120k

+50k

+10k

+50k

+45k

+0k

+110k

+200k+55k+200k

+100k

+200k+0k+0k+0k

StandardDRAMWSPMRequirements('000s)

1,356

1,490

1,563

1,669

1,765

1,838

1,804

1,764

y/yStandardDRAMBitDemandGrowth(%)

+10%

+5%

+20%

+19%

+15%

+9%

+9%

(+)UpliftduetoHigherHBMTradeRatio

N/A

(-)ImpactfromBit/WaferEfficiencies

-8%

-8%

-6%

-6%

-6%

(-)ImpactfromYieldImprovements

-5%

-5%

-5%

-5%

-5%

=Assumedy/yStandardDRAMWSPMGrowth(%)

+7%

+6%

+4%

-2%

-2%

asa%ofTotalDRAMWSPM

95%

85%

82%

78%

71%

62%

65%

67%

HBMWSPMRequirements('000s)

70

270

350

479

716

1,117

993

887

y/yHBMBitDemandGrowth(%)

+286%

+30%

+45%

+55%

+67%

-0%

+0%

(+)UpliftduetoHigherHBMTradeRatio

+5%

+8%

+3%

+3%

+3%

(-)ImpactfromBit/WaferEfficiencies

-8%

-8%

-6%

-6%

-6%

(-)ImpactfromYieldImprovements

-5%

-5%

-8%

-8%

-8%

=Assumedy/yHBMWSPMGrowth(%)

+37%

+49%

+56%

-11%

-11%

asa%ofTotalDRAMWSPM

5%

15%

18%

22%

29%

38%

35%

33%

TotalDRAMWSPMRequirements('000s)

1,426

1,760

1,913

2,149

2,480

2,955

2,797

2,651

EstimatedDRAMWSPMCapacity('000s)

1,913

2,028

2,288

2,556

2,893

3,198

Surplus/(Shortfall)

-121k

-192k

-399k

+96k

+547k

Demand/Supply(%)

106%

108%

116%

97%

83%

(1)TraditionalDRAMscaleslinearly;Intheory,1additionalwaferstartstranslatesto1additionalunitofnon-HBMDRAM

(2)DRAMcellshrinkageshouldyieldhigherbitdensity/waferovertime,especiallywithmajornodetransitions(1ナт1ニ)

(3)Improvedmanufacturingprocessesshouldyieldconsistentimprovementsforlesscomplexnon-HBMDRAM

(4)Growthinthetraderatio(from3:1т4:1andbeyond)impliesthatitwilltakemorewaferstoproduceanincrementalbitofHBM

(5)Advancesinfabricationshouldyieldhigherbitdensity/waferovertime,especiallywithmajornodetransitions(1ナт1ニ)

(6)ImprovementsinHBMmanufacturingshouldgraduallyimproveovertime,loweringtherateofgrowthrequiredinHBMWSPMs

(7)WebelieveHBMshouldaccountforagreaterportionoftotalDRAMWSPMovertheLT,drivenbygrowthintheHBMtrade

ratioandstructurallyhigherAI-relateddemand;Ourmodelestimatesthat~30%oftotalDRAMcapacitywillbeallocatedtowards

HBMoverthelong-term

IncrementalDRAMWSPMCapacity('000s):+115k+260k+268k+338k+305k

Big3MemoryVendors:

MicronHiroshimaExpansion

+13k+13k

MicronID1

+80k+40k

MicronID2

+20k+70k+30k

MicronNYFabComplex(Fab1)

+50k

MicronManassasExpansion(Fab6)

+10k

MicronPSMCFab

+20k+30k

MicronPSMCFab2(Expansion)

SamsungHwaseongConversion

+15k+30k

SamsungPyeongtaek(P4Expansion)

+70k+40k

SamsungPyeongtaek(P5)

+50k+75k+75k

SKHynixM15X

+35k+20k

SKHynixYonginFab1

+50k+50k+50k+50k

SKHynixYonginFab2

SKHynixIcheon(M16)

+50k+50k

ChineseVendors:

CXMTShanghaiFabExpansion

CXMTHefei(FabA1)

CXMTHefei(FabA2)

+50k+50k+50k+50k

CXMTBeijing(FabC1+C2)JHICCJinjiang

Locatedw/inMicron'scurrentHiroshimasite;ConstructiontobedoneEOY27,withshipmentsin~2028;DBe~25kWSPMID1HVMtostartin2027;DBeplannedcapacity~120kWSPM

ID2constructiontostartin2026,withoperationsbyEOY28;DBeplannedcapacity~120kWSPM4-FabComplex;Fab1tostartHVMin2030

MUindicateditwasmakinginvestmentstomodernizeandexpandthisfab;DBeexpansiontobe~10kWSPM

AcquiredfromPSMCin2026;MUPRindicatesfacilityhas~300ksq.ftofcleanroomspaceandnooutputuntil2H27;DBe50kWSPM(halfofoneofMU'sNYfabs)

~270ksq.ft.ofcleanroomspace(similarinsizetothefirstfab);ShipmentsstartinFY28andconstructionstartsEOYFY26(DBeexpects1-2yrbuildwithproductioninCY28)

Samsungreportedlyconvertinglegacyproductionlinesto1CDRAMbyEOY2025

RecentChosunDailyarticle(Feb-26)indicatedthattotalcapacitywouldbe100-120kWSPM(DBe~110kWSPM)

P5beginsHVMin2028;ReportedlyalargerfabwithmorecleanroomspacethanP4(DBe~200ktotalcapacity)

Constructioncompletein4Q25;SKwillrampin2026;Reportedlywilladd35kWSPM,withpotentialtofurtherexpandto55-60kPlannedcapacityof200k;FirstcleanroomtostartHVMin1Q27;Weexpectgradualrampupby2030

Plannedcapacityof200k;Noconstructionplanasofyet,butDBeassumespotentialrampstartingin2029

SKreportedlyexpandedproduction~190kin~2H25;FacilityoriginallystartedHVMin1Q21withplannedcapacityof~130k

Plannedcapacityisreportedly2-3xthatofHefeiFabs,whichhadcapacitiesof~100-150kindividuallybyEOY25;HVMin2027DBecapacitywas~100kbyEOY25

DBecapacitywas~100kbyEOY25

DBeAggregatecapacityof~100kWSPM

Plannedcapacityof~15k;HVMstartedin~2022post-EntityListdisruptions

Source:Gartner,DeutscheBankResearch

Note:Notethatthethetableaboveisabbreviated;Fullmodelavailableuponrequest

【价值目录】网整理:

Page8DeutscheBankSecuritiesInc.

9April2026

SemicapEquipment

USSemicapEquipment

%ofTotalWFESpend

61%39%

29%

27%

71%

73%

Figure6:WFESpendingMix(2022-2026E)

Foundry/LogicMemory

100%

75%

50%

25%

0%

Source:DeutscheBankResearch,CompanyData

%ofFoundryCapEx

59%

Figure8:WFEasa%ofFoundry/IDMCapEx

WFEasa%ofCapEx5-yrAvg.

75%

56%55%

50%

25%

0%

Source:DeutscheBankResearch,SemiconductorIndustryAssociation,BloombergFinanceLP

NAND:Expectinggrowthin2026,withmoderationin2027

25%

26%

75%

74%

60%

56%

Aswe'veseenthroughout2025,thesurgeindemandforHBMhassignificantlyrestrictedthenumberofwafersandcapacityavailableforothertypesofmemory.ThishasledtoaseveretighteninginNANDsupply,especiallyforproductslikeeSSDs,whichhavebeeninhighdemandgiventheirapplicationsindatacenters.Ontopofthis,weseepositiveread-throughsfromcompanieslikeLRCX,whocontinuetoexpectstrongupgrade-relatedspendingtocontinueinto2026(LRCXnotedthat2026wouldbegrowthyearforNANDonitsF2Q26call).Thatsaid,wecontinuetohaveaconstructiveoutlookonNANDWFEandareraisingour2026NANDWFEgrowthforecastfrom+19%y/yto+23%y/y.Weexpectthisgrowthtomoderateto+19%y/yin2027(unchanged),aslightdecelerationingrowthbutstillsolid.

Figure5:WFESpendingbyVertical(2022-2026E)

WFESpending($b)

LeadingF/LLaggingF/LDRAMNAND

132

150

110

9

11

97

7

19

95

23

90

8

19

32

31

100

18

20

42

40

17

36

50

23

55

42

35

35

0

Source:DeutscheBankResearch,CompanyData

Figure7:WFEasa%ofSemiRevs

%ofIndustrySales

WFEasa%ofSemiRevs5-yrAvg.

20%

17%

17%

15%

14%

13%

15%

10%

5%

0%

Source:DeutscheBankResearch,SemiconductorIndustryAssociation,BloombergFinanceLP

【价值目录】网整理:

DeutscheBankSecuritiesInc.Page9

9April2026

SemicapEquipment

USSemicapEquipment

DBFabTracker

TohelpinvestorspreciselyidentifythedriversbehindTSMC'scapitalspendingplans,we'vemappedoutallofthecompany'supcomingfront-endfabricationfacilities,alongwiththecompany'sexistingfabs.Refertothechartbelowforincrementaldetails.

Figure9:OverviewofTSMC'sFabs

Fab10(Shanghai)

-Production

-110-350nm

-Est.~100kWSPM

Fab16(Nanjing)

-Production

-12-16nm,22-28nm

-Est.~40kWSPM

Fab11(Washington)

-Production

-180-350nm

-Est.~39kWSPM

-3-5nm

-Currently~20-24kWPSM(aggregateest.capacity>100kWSPM)

Fab18(Tainan)

-Production

-3nm,4-5nm

-Est.~275kWSPM

Production

JapanFabsI+II(Kumamoto):

-Expansion

-12-40nm(FabI);3nm(FabII)

-Fab1(est.~50kWSPM);FabIIstarting2028(aggregatecapacityest.>100kWSPM)

Fab2A+B(Hsinchu)

-Production

-450nm

-Est.~86kWSPM

Fab24(Dresden):

-Underconstruction

-12-16nm,22-28nm

-Installationsin2H26;HVMin2027(est.~40kWSPM)

Fab3+4(Hsinchu)

-Production

-180-350nm

-Est.~108kWSPM

Fab5(Hsinchu)

-Production

-110-180nm

-Est.~36kWSPM

Fab8(Hsinchu)

-Production

-110-250nm

-Est.~79kWSPM

Fab20(Hsinchu):

-Expansion/ramping

-<2nmnodes

-20-25kWSPMcurrently(est.~120kWSPMbyYE26)

Fab12(Hsinchu)

-Production

-3nm

-Est.~150kWSPM

TataFab(Gujurat):

-Underconstruction

-28nmnodes

-Expectedtobeoperationalbylate2026(est.~50kWSPM)

Fab6(Tainan)

-Production

-110-180nm

-Est.~152kWSPM

SSMCJVFab(Singapore)

-Production;TSMC~38.8%share

-180-250nm

-Est.~68kWSPM

Expansion

Construction

-Permitting/underconstruction;

-2nmnodes

-HVMexpectedin2H28;(est.~50kWSPMatP1)

Source:DeutscheBankResearch,CompanyFiling,PressReleases

Notes:Ourfabdatabaseisnotexhaustiveandmayomitlesser-knownfabricationfacilities;OurdatasetisintendedtoprovideinvestorswithacomprehensiveoverviewofthemanufacturingbaseformajorIDMsandFoundries;Dataisupdatedonamonthlybasis

【价值目录】网整理:

Page10DeutscheBankSecuritiesInc.

9April2026

SemicapEquipment

USSemicapEquipment

Foundry/IDMCapEx

Weregularlymonitorspendingtrendsacrossasetof30+semiconductormanufacturersasWFEtypicallyaccountsfor~50-60%ofannualfoundry/IDMCapEx.Basedonthemostrecentdata,foundry/IDMcapitalexpendituresareexpectedtorise+27%y/yin2026and+12%y/yin2027.Theseestimatesaredirectionallyin-linewithourWFEgrowthforecasts(+20%y/yin2026and+17%in2027),butdifferentonanabsolutebasis,thoughnotethatthedeltalikelystemsfromdifferencesinthemixofinvestments(i.e.,isspendinggearedtowardsphysicalinfrastructureorcleanroomtooling?).

Figure10:Foundry/IDMCapEx

CAPITALEXPENDITURES

(in$m,unlessotherwisenoted)

A

2018

A

2019

A

2020

A

2021

A

2022

A

2023

A

2024

A

2025

E

2026

E

2027

TSMC

10,474

14,904

17,387

30,089

36,339

30,476

29,762

40,940

54,188

65,026

SamsungElectronics

26,872

21,776

31,918

41,174

38,368

44,115

37,701

33,446

43,411

47,844

Intel

15

温馨提示

  • 1. 本站所有资源如无特殊说明,都需要本地电脑安装OFFICE2007和PDF阅读器。图纸软件为CAD,CAXA,PROE,UG,SolidWorks等.压缩文件请下载最新的WinRAR软件解压。
  • 2. 本站的文档不包含任何第三方提供的附件图纸等,如果需要附件,请联系上传者。文件的所有权益归上传用户所有。
  • 3. 本站RAR压缩包中若带图纸,网页内容里面会有图纸预览,若没有图纸预览就没有图纸。
  • 4. 未经权益所有人同意不得将文件中的内容挪作商业或盈利用途。
  • 5. 人人文库网仅提供信息存储空间,仅对用户上传内容的表现方式做保护处理,对用户上传分享的文档内容本身不做任何修改或编辑,并不能对任何下载内容负责。
  • 6. 下载文件中如有侵权或不适当内容,请与我们联系,我们立即纠正。
  • 7. 本站不保证下载资源的准确性、安全性和完整性, 同时也不承担用户因使用这些下载资源对自己和他人造成任何形式的伤害或损失。

最新文档

评论

0/150

提交评论