单晶硅生长总结课件

1、Crystal Growth Summarize,Contents,Grower Introduction Growing Process Run System H/Z,Crystal Growth Summarize,I. Grower Introduction,The grower include: 1.Pull Head 2.Pull Chamber 3.Top Chamber 4.Main Chamber 5.Base Chamber 6.Frame 7. Console control panel,I. Grower Introduction,Pull Head,I. Grower

2、Introduction,Pull Head,I. Grower Introduction,Pull Chamber,I. Grower Introduction,Top Chamber,I. Grower Introduction,Top Chamber,I. Grower Introduction,Main Chamber,I. Grower Introduction,Base Chamber,Base Chamber,I. Grower Introduction,Frame,I. Grower Introduction,Console control panel,II. Growing

3、Process,Crystal Growing Process,Poly Silicon Melting Single Crystal Seed Single Crystal Solidification Slicing & Wafe.,Stacking,Vacuum,Melting,Soaking,STB,Dipping,Shoulder,Necking,Body,Cooling,Tail,Cleaning,II. Growing Process,Stacking,II. Growing Process,Melt,Stacking over, then set up the H/Z and

4、vacuum, if the leak rate is in spec go to melt process.,II. Growing Process,Dumping,II. Growing Process,Dipping,Go to soaking for 12 hours after melted, then find the dipping Temp (STB) and dipping process start.,II. Growing Process,Necking,Looks meniscus is Good Dip shape, then go to necking proces

5、s.,II. Growing Process,Shoulder,Actual neck length lead to target length then go to necking process.,II. Growing Process,Body,When Camera Diameter Approach to target Diameter then go to body process auto.,II. Growing Process,Tail,Actual body length lead to target length then go to tail process auto.

6、 Then cool the grower.,II. Growing Process,Cooling,8 hours cooling ,then remove the ingot. Finally cleaning the grower.,II. Growing Process,Cleaning,Need cleaning parts: T-Chamber、Tap、Upper B、3D、Heater、Exhaust、Dust Filter.,II. Run System,Argon Control System,II. Run System,Compress Air Control System,II. Run System,Power Supply,II. Run System,Vacuum System,Aux. pump,Main. pump,II. Run System,Vacuum System,II. Run System,Dust Filter,II. Run System,Dust Filter,II. Run System,Cooling Water System