EBL基本组成及工作原理PPT课件

精选,1,宋晨之20150202,EBL基本结构与工作原理,精选,2,EBL=ElectronBeamLithography=电子束光刻,精选,3,精选,4,一、电子束曝光系统结构,精选,5,精选,6,column,精选,7,电子源的分类,直热式W，2700K热发射电子源旁热式LaB6，1800K电子源热场发射ZrO/W，1800K场发射电子源冷场发射,精选,8,四种电子源对比,电子源三个关键参数：有效源尺寸，亮度，电子能量分布热发射源能量分布大，聚焦斑束大，产生严重相差。冷场致发射稳定性差，对真空要求高。故EBL系统选用热场致发射源。,精选,9,旁热式&热场致电子源结构示意图,阳,地,超高电场,阴,阴,阳,精选,10,EBL中电子源结构示意图,精选,11,几个牌子的EBL性能参数,精选,12,二次电子探测器,Detector,精选,13,Illustrationswithdifferentsignalsources,精选,14,精选,15,ImagingbymeansofSE2detector:5mmWDImagingbymeansofInlensdetector:=10mmWD(dependingonhighvoltagesetting)ImagingbymeansofBSEdetector:8-10mm(OptimumoftheBSelectrondetection),精选,16,InfluenceofAccelerationVoltage,精选,17,InfluenceofBeamCurrent,精选,18,InfluenceofWorkingDistance,精选,19,二、坐标系的对准,精选,20,建立坐标系,精选,21,写场对准,精选,22,三、曝光,精选,23,扫描模式,精选,24,Exposureparameter,精选,25,Areadose,精选,26,Linedose,精选,27,Dotdoes,精选,28,Areamode,精选,29,精选,30,Linemode,精选,31,Circlemode,精选,32,ExposurestrategiesUsedbyRaith,精选,33,四、临近效应,精选,34,VisualizationofEnergyDepositionGrid(EDG),精选,35,高能电子打断PMMA内高分子链示意图,精选,36,前散射和背散射随PMMA厚度的变化关系,精选,37,MonteCarloSimulations,精选,38,Energydeposition,精选,39,Proximityfunction,trajectories,energydeposition,energydistribution,doubleGaussian,Proximityfunction,proximityfunctionhasthesameshapeasenergydistributionwithrespecttolateraldistancesbut:nodirectrelationbetweenenergyandPE!(itsjustamodel),精选,40,I